期刊文献+

Analysis of Aberrations in Laser-Focused Nanofabrication

Analysis of Aberrations in Laser-Focused Nanofabrication
原文传递
导出
摘要 Based on the semi-classical model, we analyse the motion equation of chromium atoms in the laser standing wave field under the condition of low intensity light field using fourth-order Adams-Moulton algorithm. The trajectory of the atoms is obtained in the standing wave field by analytical simulation. The image distortion coming from aberrations is analysed and the effects on focal beam features are also discussed. Besides these influences, we also discuss the effects on contrast as well as the feature width of the atomic beam due to laser power and laser beam waist. The simulation results have shown that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width. Based on these analyse, we present some suggestions to minimize these influences. Based on the semi-classical model, we analyse the motion equation of chromium atoms in the laser standing wave field under the condition of low intensity light field using fourth-order Adams-Moulton algorithm. The trajectory of the atoms is obtained in the standing wave field by analytical simulation. The image distortion coming from aberrations is analysed and the effects on focal beam features are also discussed. Besides these influences, we also discuss the effects on contrast as well as the feature width of the atomic beam due to laser power and laser beam waist. The simulation results have shown that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width. Based on these analyse, we present some suggestions to minimize these influences.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2007年第7期1890-1893,共4页 中国物理快报(英文版)
关键词 NEUTRAL-ATOM LITHOGRAPHY STANDING-WAVE LIGHT DEPOSITION BEAM NEUTRAL-ATOM LITHOGRAPHY STANDING-WAVE LIGHT DEPOSITION BEAM
  • 相关文献

参考文献21

  • 1Drodofsky U, Drewsen M, Pfau T, Nowack S and Mlynek J 1996 Microelectron. Engin. 30 383
  • 2Jurdik E, Hohlfeld J, Kempen H and Rasing T 2002 Appl. Phys. Lett. 23 4443
  • 3Timp G, Behringer R E, Tennant D M and Cunningham J E 1992 Phys. Rev. Lett. 69 1636
  • 4McClelland J J, Behringer R E and Tennant D M 1993 Science 262 877
  • 5Gupta R, McClelland J J and Marte P 1995 Appl. Phys. Lett. 67 1378
  • 6Schulze T, Brezger B, Schmidt P O, Mertens R, Bell A S, Pfau T and Mlynek J 1999 Microelectron. Engin. 46 105
  • 7Ohmukai R, Urabe S and Watanabe M 2003 Appl. Phys. B 77 415
  • 8Sligte E, Smeets B, Stam K M R, Herfst R W, Straten P, Beijerinck H C W and Leeuwen K A H 2004 Appl. Phys. Lett. 85 4493
  • 9Fioretti A, Camposeo A, Tantussi F, Arimondo E, Gozzini S and Gabbanini C 2005 Appl. Surf. Sci. 248 196
  • 10Berggren K.K, Prentiss M, Timp G L and Behringer R E 1994 J. Opt. Soc. Am. B 11 1166

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部