摘要
本文采用中频反应磁控溅射方法在玻璃表面制备了TiO2薄膜,为使反应溅射的工作点能够稳定在"过渡区",得到较高的薄膜沉积速率,使用了等离子体发射光谱监控法(Plasma Emission Monitor,PEM)对溅射过程进行控制。利用台阶仪测膜厚,用X射线衍射(XRD)和透射率光谱扫描等测试方法对薄膜的特性进行表征。对制得的薄膜进行了光照试验,研究了温度、PEM工作点等不同工艺条件对薄膜亲水性的影响。薄膜经过1 h左右的紫外光照射,得到了很好的亲水性效果,其表面的水接触角达到了小于1°的水平。将薄膜经过光照后再置于黑暗中一段时间,如此循环了5次,仍具有很好的光致亲水效果,证明此过程是可以循环重复的。
TiO2 films were grown on glass substrates by reactive mid-frequency magnetron sputtering, and controlled by plasma emission monitor（PEM）. The films were characterized with X-my diffraction（XRD）, surface profiler, and specular transmission. The influence of substrate temperature and the set-point of plasma intensity on ultraviolet（UV） light induced hydrophilicity of the TiO2 films was studied. The TiO2 films show exceUent hydrophihcity, with water contact angle less than 1°, after irradiation of UV hght for one hour. Reversible transition of hydrophobicity to super-hydrophihcity was observed and controlled well by alternation of UV light irradiation and dark storage.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2007年第5期413-417,共5页
Chinese Journal of Vacuum Science and Technology
关键词
TIO2薄膜
亲水性
PEM
反应溅射
TiO2 thin films, Hydrophilicity, PEM, Reactive sputtering
