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模拟水中白铜B30耐蚀性影响因素的光电化学研究 被引量:12

Photoelectrochemical Study of Influence Factors on Corrosion Resistance of Cupronickel B30 in Simulated Water
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摘要 用动电位伏安法和光电化学方法对模拟水中白铜B30耐蚀性影响因素进行了研究.白铜B30表面膜显示p-型光响应,光响应来自电极表面的Cu2O层,在模拟水溶液中表面膜的半导体性质会发生转变,由p-型转为n-型;在不同Cl-,SO24?浓度的模拟水溶液中,电位正向扫描时呈现阳极光电流,电位负向扫描时随着Cl-,SO24?离子浓度的增加,光响应由p-型向n-型转变,阳极光电流峰面积与阴极光电流峰面积之比增大,耐蚀性能降低;随着温度的升高,白铜B30的耐蚀性能降低;在pH=7~9之间,其耐蚀性能随着pH的升高而提高,当pH>9时,其耐蚀性能随着pH的升高呈降低趋势. Influence factors on semiconduction properties of oxide films on a cupronickel electrode in the simulated water was studied by cyclic voltammetry and photocurrent response method. The cupronickel electrode showed p-type photoresponse, which came from Cu2O layer on its surface. The photoresponse changed to n-type in the simulated water. The transition from p-type to n-type might be related to the doping of Cl^- and SO4^2- anions into Cu2O film. It did not show n-type photoresponse when the cupronickel electrode was immersed in the simulated water containing some sulfide. It was shown that the degree of corrosion increased with the concentration of these anions and temperature. In addition, as the pH increased between 7 and 9, the corrosion resistance of B30 was enhanced, while it lowered as the pH was beyond 9.
出处 《化学学报》 SCIE CAS CSCD 北大核心 2007年第18期1981-1986,共6页 Acta Chimica Sinica
基金 国家自然科学基金(Nos.20406009 50371053) 上海市曙光计划(No.04SG55) 上海市教委重点项目(No.06ZZ67) 上海市科技攻关计划(No.062312045) 厦门大学固体表面物理化学国家重点实验室开放课题(No.200512) 上海市重点学科(P1304)建设资助项目.
关键词 白铜B30 模拟水 光电化学 腐蚀 cupronickel alloy simulated water photoelectrochemistry corrosion
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  • 1周国定,ModestovAD,潘传智,杨迈之,蔡生民.铜电极光电响应p型转变为n型的机理探讨[J].物理化学学报,1995,11(1):51-55. 被引量:17
  • 2Modestov,A.D.;Zhou,G.-D.;Ge,H.-H.;Loo,B.H.J.Electroanal.Chem.1995,380,63.
  • 3Kamkin,A.N.;Davydov,A.D.;Zhou,G.-D.;Marichev,V.A.J.Electrochem.1999,35(5),1023.
  • 4Kamkin,A.N.;Zhou,G.-D.;Davydov,A.D.J Solid State Electrochem.1999,3,457.
  • 5Modestov,A.D.;Zhou,G.-D.;Wu,Y.-P.;Notoya,T.;Schweinsberg,D.P.Corros.Sci.1994,36(11),1931.
  • 6Kamkin,A.N.;Zhon,G.-D.Protection of Metals 2000,36(6),541.
  • 7Kamkin,A.N.;Zhou,G.-D.;Davydov,A.D.Protection of Metals 2001,37(1),64.
  • 8Modestov,A.D.;Zhou,G.-D.;Ge,H.-H.;Loo,B.H.J Electroanal,Chem.1994,375,293.
  • 9Hao,Y.-Z.;Yang,M.-Z.;Yu,C.Thin Solid Films 1999,347,289.
  • 10Zhou,G.-D.;Shao,H.;Loo,B.H.J.Electroanal.Chem.1997,421,129.

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