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外加电场对光折变高阶响应影响的微扰分析 被引量:3

Perturbative Analysis of Effect of Applied Electric Field on High order Response of Photorefractive Effects
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摘要 应用微扰展开法于“跳跃模型”,给出了空间电荷场前三阶分量随时间、外加电场等变化的解析表达式。同时讨论了外加电场对各阶空间电荷场建立的影响。当扩散场与外加电场可比拟时,外加电场对空间电荷场的影响不大;随着空间电荷场阶数的提高,其达到最大饱和值所需的外加电场越小。在外加电场作用下,空间电荷场各阶分量随时间呈振荡衰减,直到达到饱和。外加电场越大,振荡越强烈,周期越短。在考虑高阶分量的贡献后。 The analytic expressions for the first three higher order harmonics of the space charge field versus time and the applied field are presented by using perturbative expanding to “the hopping model” of Feinberg. The results are valid for arbitrary strengths of characteristics′ fields in the photorefractive materials with arbitrary values of the modulation depths. We aslo study the effect of the applied field on recording of the first three higher order harmonics of the space charge field. It shows that the effect on the space charge field is very small at case of large diffusion field. The applied field for the maximum saturation values becomes small with the order increasing. With an applied field, higher order harmonics of the space charge field show oscillating attenuation versus time until to reach saturation state. The oscillating is strong as the applied field increases with shorter oscillating period. The oscillating amplitude of the space charge field increases while the contribution of the higher order harmonics are considered.
出处 《光学学报》 EI CAS CSCD 北大核心 1997年第6期710-716,共7页 Acta Optica Sinica
基金 山东大学晶体材料研究所开放实验室资助
关键词 微扰分析 光折变高阶响应 跳跃模型 空间电荷 perturbative analysis, higher order response of photorefractive effects, hopping model, space charge field, diffusion field.
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参考文献2

  • 1孙万钧,物理学报,1996年,16卷,2期,940页
  • 2刘思敏,光折变非线性光学,1992年,30页

同被引文献43

  • 1宋军,庞冬青,何赛灵.光折变全息光栅扭曲对波分复用应用的影响[J].中国激光,2004,31(10):1217-1221. 被引量:4
  • 2戴翠霞,刘立人,刘德安,柴志方,周煜.采用紫外光提高双掺杂铌酸锂晶体中全息记录的灵敏度和光栅强度[J].光学学报,2005,25(12):1600-1605. 被引量:5
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  • 7G. A. Brost. Photorefractive grating formations at large modulation with alternating electric fields[J]. J. Opt. Soc. Am. B,1992,9(8):1454-1460.
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