摘要
主要研究和探讨了Ｌｉ２Ｏ－Ａｌ２Ｏ３－ＳｉＯ２系统光敏微晶玻璃热处理制度及曝光时间对其析晶晶相及其在氢氟酸中侵蚀的作用和影响。
In the paper, the infuluence of heat treatment temperature and exposure time on crystallization phases and corresion in HF of photoactive glass cermic in the system of Li 2O Al 2O 3 SiO 2 were studied. By the meants of X ray diffration, low temperature crystallization phases was studied.
