摘要
采用电化学测量技术和原子力显微镜(AFM)研究室温含氧或无氧0.5 mol/L NaCl水溶液中铜的缝隙腐蚀现象。结果表明,铜发生缝隙腐蚀的过程中,金属腐蚀电位朝负移动,至一最低值并保持不变。同时,观察到铜缝隙腐蚀形态与通常的不锈钢缝隙腐蚀现象不同,即缝外腐蚀严重,缝内腐蚀相对较轻或几乎没有。发生这种现象主要是由于形成了金属离子浓差电池引起的。
With the aid of electrochemical measurements and atomic force microscopy （ AFM）, Copper crevice corrosion was studied in 0.5 M NaCl solution open to the air at room temperature or in the deoxygenated solution. Results showed that corrosion potential moved negatively till the lowest value was reached and kept stable during the procedure of copper crevice corrosion. Moreover, the characteristics of copper crevice corrosion were distinct from that of common crevice corrosion observed in other passive metals. That is, it attacked bold surface and the corrosion-free surface in the crevice were observed in copper crevice corrosion, which might be attributed to metal differential concentration cell.
出处
《装备环境工程》
CAS
2007年第3期31-34,共4页
Equipment Environmental Engineering
基金
国家自然科学基金资助项目(50571022)
关键词
缝隙腐蚀
原子力显微镜
表面形貌
腐蚀电位
crevice corrosion
atomic force microscopy
surface morphology
corrosion potential
