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低气压等离子喷涂TiO_2涂层的电学性能研究 被引量:1

A Study on the Electrical Property of Low Pressure Plasma Sprayed TiO_2 Coating
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摘要 本文利用改变低气压等离子喷涂(LPPS)TiO_2时工艺参数的方法,发现了TiO_2涂层还具有优良的电学性能。得出涂层的电导率与喷涂过程中TiO_2的氧分解量成比例增加,但涂层中的Ti_2O_3含量对电导率影响较大。涂层的光电流-电位特性依赖于涂层结构,当金红石形TiO_2涂层中含有适量的Ti_3O_5和Magneli相时,表现出最佳光电流-电位特性,并与光强度成正比例关系,若涂层全部由金红石形TiO_2或Ti_2O_3,Ti_3O_5和Magneli组成时,光电流-电位特性消失。 It has been discovered that the TiO2 coating can get a good electrical property by changing the technical parameters in low pressure plasma sprayed ( LPPS ) TiO2 coating. The conductivity of the coating is directly proportional to the oxygen loss of TiO2 during the spraying, while the quantity of Ti2O3 in the coating influences the conductivity to a great extent. The photocurrent-potential property of the coating depends on the structure of the coating. When there are appropriate Ti3O5 and Magneli phase in Rutile TiO2 coating, Rutile TiO2 coating will show an optimum photocurrent-potential property being directly proportional to light intensity. If the coating entirely consists of Rutile TiO2 or three substances of Ti2O3, Ti3O5 and Magneli phase,the photocurrent-potential property of the coating will disappear.
出处 《甘肃工业大学学报》 1990年第1期45-52,共8页 Journal of Gansu University of Technology
关键词 TIO2 等离子喷涂 涂层 电学性质 electrical conductivity,coating,plasma spraying, photocurrent-electric potential
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参考文献1

  • 1陈学定,大森明,荒田吉明.涂层结构的研究[J]焊接学报,1988(04).

同被引文献8

  • 1曲远方.功能陶瓷物理性能[M].北京:化学工业出版社,2007.
  • 2Palmer R A, Doan T M, Lloyd P G, et al. Reduction of TiO2 with hydrogen plasma [ J ]. Plasma Chemistry and Plasma Processing, 2002, 22(3): 335- 349.
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  • 4Berger L M, Thiele S, Nebelung M, et al. Spray powders and coatings on the basis of titanium suboxides[ C]// Thermal Spray 2001, New Surfaces for a New Millennium, ASM International, Materials Park, Ohio, Singapore 2001 : 291 - 300.
  • 5Otmlori A, Park K C, Inuzuka M, et al. Electrical conductivity of plasmasprayed titanium oxide (futile) coatings [ J ]. Thin Solid Flims, 1991, 201(1) : 1 - 8.
  • 6Branland N, Meillot E, Fauchais P, et al. Relationships between microstructure and electrical properties of RF and DC plasma-sprayed titania coating[J]. Journal of Thermal Spray Technology, 2006, 15 (1):53-62.
  • 7Kanta A F, Montavon G, Planche M P, et ol. Artificial intelligence computation to establish relationships between APS process tmrmneters and aluminatitania coating properties [J]. Plasma Chemistry and Plasma Processing, 2008, 28(2) : 249 - 262.
  • 8Patil P S, Mujawar S H, Inamdar A I, et al. Structural, electrical and optical properties of TiO2 doped WO3 thin films [ J ]. Applied Surface Science,2005, 252(5): 1643- 1650.

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