摘要
针对CVD金刚石膜生长手动控制的种种不便,在生长系统中引入了计算机控制,实现了用计算机控制生长金刚石膜的衬底温度。详细介绍了计算机控制系统的设计和实现方法。实际运行结果表明,该系统稳定性好、可靠性高,实现了金刚石膜稳定生长。
It is very inconvenient to readjust the key parameters manually in the growth process of CVD diamond film. So a computerized control was developed and used in CVD system to monitor the substrate temperature. Describes the design and realization of the computerized control system. The experimental results show that the system is stable and reliable to the growth of diamond film.
出处
《真空》
CAS
北大核心
2007年第3期51-53,共3页
Vacuum
关键词
HFCVD
金刚石膜
衬底温度
计算机控制
HFCVD （Hot-Filament Chemical Vapor Deposition）
diamond film
substrate temperature
computerized control
