期刊文献+

新型全方位反射铝镓铟磷薄膜发光二极管 被引量:3

A novel AlGaInP thin-film light emitting diode with omni directional reflector
原文传递
导出
摘要 提出了一种新型全方位反射铝镓铟磷(AlGaInP)薄膜发光二极管(LED)的结构和制作工艺,在这个结构里应用了低折射率的介质和高反射率的金属联合作为反光镜.用金锡合金(80Au20Sn,重量比)作为焊料把带有反光镜的AlGaInPLED外延片倒装键合到GaAs基板上(RS-LED),去掉外延片GaAs衬底,把被GaAS衬底吸收的光反射出去.通过与常规AlGaInP吸收衬底LEDs(AS-LED)和带有DBR的AlGaInP吸收衬底LEDs(AS-LED(DBR))电、光特性的比较,证明新型全方位反射AlGaInP薄膜LED结构能极大提高亮度和效率.正向电流20mA时,RS-LED的光输出功率和流明效率分别是AS-LED的3.2倍和2.2倍,是AS-LED(DBR)的2倍和1.5倍.RS-LED(20mA下峰值波长627nm)的轴向光强达到194.3mcd,是AS-LED(20mA下峰值波长624nm)轴向光强的2.8倍,是AS-LED(DBR)(20mA下峰值波长623nm)轴向光强的1.6倍. A novel AlGaInP thin-film light emitting diode (LED) with omni directional reflector structure was proposed, the corresponding fabrication process was developed. This reflector is realized by the combination of a low-refractive-index dielectric layer and a high reflectivity metal layer. The AlGaInP LED layers with dielectric-metal reflector is invertedly bonded to the GaAs submount by using 80Au-20Sn (wt%) alloy as a solder (Reflector-Submount, RS-LED), and then GaAs substrate is removed. The light that would otherwise be absorbed by the GaAs substrate is reflected by the high reflectivity dielectric-metal reflector. The optical and electrical characteristics of the RS-LED are presented and compared with the conventional AlGaInP absorbing substrate (AS) LED and AlGaInP absorbing substrate LED with distributed Bragg reflectors (DBR). A great improvement in the brightness and efficiency is observed. It is shown that the light output and lumen efficiency from the RS-LED at forward current 20 mA exceed those of AS-LED by about a factor of 2.2 and 1.2, respectively, and - 2 × the light output of AS-LED (DBR) and - 1.5 × the lumen efficiency of AS-LED (DBR) were achieved. 194.3 mcd luminous intensity from the RS-LED (at 20 mA, peak wavelength 627 nm) could be obtained under 20 mA injection, which is 2.8 and 1.6 times higher in luminous intensity than the AS-LED (at 20 mA, peak wavelength 624 nm) and AS-LED(DBR) (at 20 mA, peak wavelength 623 nm), respectively.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2007年第5期2905-2909,共5页 Acta Physica Sinica
基金 北京市人才强教计划项目(批准号:05002015200504) 北京市科委高效高亮度单芯片半导体照明器件的研发与产业化(批准号:D0404003040221)资助的课题~~
关键词 铝镓铟磷 薄膜发光管 全方位反射镜 发光强度 AlGaInP, thin-film LED, omni directional reflector, luminous intensity
  • 相关文献

参考文献10

  • 1刘鲁,范广涵,廖常俊,曹明德,陈贵楚,陈练辉.AlGaInP四元系材料渐变异质结及其在高亮度发光二级管器件中的应用[J].物理学报,2003,52(5):1264-1271. 被引量:3
  • 2Wayne.Jan,Tzer Perng Chen,Chih Sung Chang 2004 Proc.of SPIE 5366 62
  • 3Kuo C P,Fletcher R M,Osentowski T D Lardizablal M C,Craford M G 1990 Appt.Phys.Lett 57 2937
  • 4Sugawara H,Ishikawa M,Hatakoshi G 1991 Appl.Phys.Lett 58 1010
  • 5Chang S J,Chang C S,Su Y K,Chang P T,Wu Y R,Huang K H,Chen T P 1997 IEEE Photon.Technol.Lett 9 182
  • 6Sugawara H,Itaya K,Halakoshi G 1994 J.Appl.Phys.33 6195
  • 7Chang S J,Sheu J K,Su Y K,Jou M J,Chi G C 1996 Jpn.Appl.Phys.Lett.35 4199
  • 8Hofler C E,Vanderwater D A,DeFevere D C,Kish F A,Camras M D,Steranak F M,Tan I H 1996 Appl.Phys.Lett.69 803
  • 9Sheu J K,Su Y K,Chang S J,Joe M J,Chi G C 1998 Proc.Inst.Elect.Eng.-Optoelectron.145 248
  • 10Kish F A,Vanderwater D A,DeFevere D C,Steigerwald D A,Hofler G E,Park K G,Steranka F M 1996 Electron.Lett.32 132

二级参考文献1

共引文献2

同被引文献36

  • 1程海英,方文卿,莫春兰,刘和初,王立,江风益.δ掺杂对Si衬底GaN蓝光LED外延膜性能的影响研究[J].光学学报,2006,26(8):1269-1273. 被引量:4
  • 2熊传兵,江风益,方文卿,王立,刘和初,莫春兰.硅基GaN蓝光LED外延材料转移前后性能[J].中国科学(E辑),2006,36(7):733-740. 被引量:1
  • 3齐龙茵,张德贤,何俊峰,崔光龙,赵飞,刘召军,李胜林.电子束低温蒸发ITO膜增透、增反特性研究[J].真空,2006,43(6):8-10. 被引量:1
  • 4蔡琪,曹春斌,江锡顺,宋学萍,孙兆奇.ITO薄膜的微结构表征及其组分特性[J].真空科学与技术学报,2007,27(3):195-199. 被引量:24
  • 5姚雨,靳彩霞,董志江,孙卓,黄素梅.用表面粗化ITO的欧姆接触提高GaN基LED性能(英文)[J].液晶与显示,2007,22(3):273-277. 被引量:12
  • 6S. Nakamura, M. Senoh, N. Iwasa et al.. High-Brightness InGaN blue, green and yellow Iight-emitting diodes with quantum well structures[J]. Jpn. J. Appl. Phys., 1995, 34: 797-799
  • 7S. Nakamura, M. Senoh, N. Iwasa et al.. Superbright green InGaN single-quantum-well strucure light-emitting diodes[J].Jpn. J. Appl. Phys.. 1995, 34:1332-1335
  • 8S. Nakamura, M. Senoh, N. Iwasa et al.. Superbright green InGaN single-quantum-well-strucure Iight-emitting diodes[J]. Jpn. J. Appl. Phys., 1995, 34: 1332-13353 S. Nakamura, M. Senoh. High-power GaN p-n junction blue-light-emitting diodes[J]. Jpn. J. Appl .Phys., 1991, 30: 1998-2001
  • 9O. B. Shchekin, J. E. Epler, T. A. Trottier et al.. High performance thin-film flip-chip InGaN-GaN light-emitting diodes[J]. Appl. Phys. Lett., 2006, 89(7): 071109-1-071109-3
  • 10N. A. El-Masry, E. L. Piner, S. X. Liu. Phase separation in InGaN grown by metalorganic chemical vapor deposition[J]. Appl. Phys. Lett., 1998, 72(1): 40-42

引证文献3

二级引证文献17

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部