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多孔硅-PMMA/DR1复合膜制备方法的研究(英文)

Fabricating of Porous Silicon Waveguide Devices by Electrochemical Anodisation Method
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摘要 报道了用电化学腐蚀法结合激光干涉或聚合物掩膜制备多孔硅通道波导、定向耦合器、波导棱镜、光栅耦合器和激光诱导动态光栅等光子器件,并给出了这些多孔硅光波导器件的性能参数,研究结果表明可利用多孔硅开发出新的全硅光电子器件. Porous silicon buried channel optical waveguides, waveguide directional coupler, waveguides prism, grating coupler and laser-induced dynamic grating fabricated by electrochemical anodisation method assisted by laser beams interference or polymer masking have been reported in this paper. The properties of these optical waveguide devices bare been analyzed. The experimental results show that porous silicon can be used to develop new all-silicon optoelectronic integrated devices.
出处 《新疆大学学报(自然科学版)》 CAS 2007年第2期134-138,143,共6页 Journal of Xinjiang University(Natural Science Edition)
基金 Supported by Program for New Century Excellent Talents in University of the P.R.China(Grant number:NCET-05-0897) Scientific Research Project for Universities in Xinjiang(Grant number:XJEDU2004E02 and XJEDU2006I10).
关键词 多孔硅 波导 棱镜 耦合光栅 porous silicon waveguide prism grating coupler
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