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离子辐照后4H-SiC晶体退火前后的光谱研究 被引量:2

FTIR and Raman spectra of ion irradiated and annealed 4H-SiC
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摘要 分析了高能Pb27+辐照预注入12C+的和未预注入12C+ 4H-SiC样品在,退火前后傅立叶变换红外光谱和拉曼散射光谱的变化。从傅立叶变换红外光谱可以知道,900℃以上的退火使损伤层发生显著恢复;在拉曼散射光谱中可以看到1200℃退火后有石墨相的存在。实验结果说明,高温退火有利于损伤的恢复,使注入到碳化硅中的碳原子发生聚集并引起相变。 The 4H-SiC specimens were implanted with 110keV C-ions and then irradiated with 230MeV Pb-ions and subsequently annealed at different temperatures in vacuum. The samples were investigated after each annealing stage by using FrIR and Raman spectroscopy. The obtained FrIR spectra showed several interference fringes in the range from 960 cm^-1 to 1450 cm^-1. The intensity of fringes decreases with the increase of annealing temperature, and an abrupt decrease of the fringe intensity was found for annealing above 900℃, indicating that there was a significant recovery of the irradiation-induced damage in the crystal for annealing at high temperatures. The Raman spectroscopy showed that after annealing at 1200℃ for 30 rain the amorphous layer was recovered and the precipitation of carbon atoms in graphite occurred.
出处 《核技术》 EI CAS CSCD 北大核心 2007年第4期314-317,共4页 Nuclear Techniques
基金 国家自然科学基金项目(批准号10575124) 中国科学院"西部之光"人才培养计划资助的项目
关键词 离子注入 辐照 4H-SIC FTIR RAMAN谱 退火 Ion implantation, Irradiation, 4H-SiC, FrIR, Raman spectra, Annealing
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参考文献12

  • 1Pe'cz B, Weishart H, Heera V. Appl Phys Lett, 2003, 82:46-48.
  • 2Heera V, Skorupa.W. J Appl Phys, 2000, 76:2847-2849.
  • 3Bozdog C, Yakovlev V, Bosch C S, et al. Phys Stat Sol (c),2002, 0:443 -447.
  • 4Yaguchi H, Narita K, Hijikata Y, et al. Mater Sci Forum,2002, 389-393:621-624.
  • 5Hiroshi H. Micro Eng, 2006, 83:126-129.
  • 6Nakashima S, Harima H. Phys Stat Sol (a), 1997, 162:39-64.
  • 7Ziegler J F, Biersack J P, Littmark U. The stopping and range of ions in solids, Vol. 1: New York: Pergamon Press,1984.
  • 8刘玉龄.微电子技术工程-材料、工艺与测试.北京:电子工业出版社,2004.137-139.
  • 9Snead L L, Zinkle S J, Nucl Instr Meth, 2002, B191:497-503.
  • 10Feng Z C, Yah F, Chang W Y, et al. Mater Sci Forum,2002, 389-393:647-650.

同被引文献24

  • 1张崇宏.碳化硅中惰性气体离子辐照引起缺陷的研究[J].原子核物理评论,2006,23(2):185-188. 被引量:1
  • 2Davis R F, Sitar Z, Williams B E, Kong H S, Kim H I, Palmour J W, Emond J A, Ryu J, Glass J T, Carter C H 1988 Mater. Sci. Eng. B 1 77
  • 3Grlffioen C C, Evans J H, de Jong P C, van Veen A 1987 Nucl. lnstrum. Meth. Phys. Res. B 27 417
  • 4Myers S M, Bishop D M, Follstaedt D M, Stein H J, Wampler W R 1993 Mat. Res. Soc. Symp. 283 49
  • 5Zhang C H, Donnelly S E, Vishnyakov V M, Evans J H 2003 J. Appl. Phys. 94 6017
  • 6van Veen A, Rivera A, Schut H, van Gog H 2004 Nucl. lnstrum. Meth. Phys. Res. B 216 264
  • 7Heft A,Wendler E, Bachmann T, Glaser E, Wesch W 1995 Mater. Sci. Eng. B 29 142
  • 8Heft A,Wendler E, Heindl J, Bachmann T, Glaser E, Strunk H P, Wesch W 1996 Nucl. Instrum. Meth. Phys. Res. B 113 239
  • 9Nakashima S,Harima H 1997 Phys. Star. Sol. A 162 39
  • 10Ziegler J F, Biersaek J P, Littmark U 1984 The Stopping and Range oflons in Solids (New York: Pergamon Press) Vol 1

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