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La_(0.3)Sr_(0.7)TiO_3模板层对Pb(Zr_(0.5)Ti_(0.5))O_3薄膜的铁电性能增强效应的研究 被引量:3

Enhanced ferroelectricity of Pb(Zr_(0.5)Ti_(0.5))O_3 film by the introduction of La_(0.3)Sr_(0.7)TiO_3 template layer
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摘要 通过sol-gel法在Si(111)基片上分别制备了LaNiO3(LNO)底电极和LaNiO3/La0.3Sr0.7TiO3(LNO/LSTO)底电极.然后采用sol-gel方法,在两种衬底上分别制备了Pb(Zr0.5Ti0.5)O3(PZT)铁电薄膜.XRD分析表明,两种PZT薄膜均具有钙钛矿结构,且在LNO底电极上的PZT薄膜呈(100)择优取向,而在LNO/LSTO底电极上的PZT薄膜呈随机取向.铁电性能测试表明,相对LNO衬底上制备的PZT薄膜,在LNO/LSTO底电极上制备的PZT薄膜的剩余极化强度得到了有效的增强,同时矫顽场也增大.介电常数和漏电流的测试表明,LNO/LSTO底电极上制备的PZT薄膜具有大的介电常数和漏电流. LaNiO3 (LNO) and LaNiO3/La0.3 Sr0.7 TiO3 (LNO/LSTO) bottom electrodes were prepared on Si ( 111 ) substrates by sol-gel process. Then Pb (Zr0.5 Ti0.5 )O3 (PZT) ferroeleetrie films were then deposited on the bottoms also by sol-gel process. XRD showed that both of the PZT films have perovskite structure. The one on LNO bottom adopts (100) preferred orientation and the one on LNO/LSTO bottom adopts random orientation. The results of ferroelectric measurement showed that the ferroelectricity of the PZT film on LNO/LSTO bottom electrode was substantially enhanced compare with the one on LNO bottom electrode. The coercive field was also enhanced. The film on LNO/LSTO bottom electrode has larger dielectric constant and leakage current.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2007年第3期1735-1740,共6页 Acta Physica Sinica
基金 湖北省教育厅重大科技项目基金(批准号:Z20052001) 黄石市科技攻关计划项目基金(批准号:黄科技发成[2006]18号) 湖北师范学院研究生启动基金(批准号:2004J04)等资助的课题.~~
关键词 PZT薄膜 铁电性 漏电流 La0.3 Sr0.7 TIO3 PZT film, ferroelecticity, leakage current, La0.3 Sr0.7 TiO3
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  • 1马建华,孟祥建,孙璟兰,胡志高,褚君浩.化学溶液法制备的Bi_(3.25)La_(0.75)Ti_3O_(12)和Bi_(3.25)Nd_(0.75)Ti_3O_(12)薄膜的光学特性[J].物理学报,2005,54(8):3900-3904. 被引量:2
  • 2Kuroda A et al 1996 Appl. Phys. Lett. 69 1565.
  • 3Huang Z et al 1999 J. Appl. Phys. 85 7355.
  • 4Polla D L and Francis L F 1998 Annu. Rev. Mater. 28 563.
  • 5Li Z Q,Chem M, Shen W B and Li J D 2001 Acta Phys. Sin. 50 2477 (in Chinese)
  • 6Scott J E 1998 Ferroelect. Rev. 1 1.
  • 7Binning et al 1986 Phys. Rev. Lett. 56 930.
  • 8Shen D H 2001 Chin. Phys. 10 S163.
  • 9Ahn C H et al 1997 Sclence 276 1100.
  • 10Zavala G et al 1997 J. Appl. Phys. 81 7840.

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  • 1杨彩霞,林殷茵,汤庭鳌.溶胶-凝胶法制备BiFeO_3铁电薄膜的结构和特性[J].功能材料,2005,36(3):340-342. 被引量:14
  • 2刘红日,刘堂昆,李景德.溶胶-凝胶方法制备BiFeO_3薄膜及其铁电性质[J].功能材料与器件学报,2005,11(2):168-172. 被引量:9
  • 3王华,任鸣放.快速退火工艺条件下温度对Bi_4Ti_3O_(12)铁电薄膜微观结构与性能的影响[J].材料科学与工程学报,2006,24(1):93-96. 被引量:2
  • 4Li W, Chen A P, Lu X M, et al. Priority of domain wall pinning during the fatigue period in bismuth titanate ferroelectric thin films[J]. Appl Phys Lett, 2005, 86: 192908.
  • 5Park B H, Kang B S, Bu S D, et al. Lanthanum - substituted bismuth titanate for use in non - volatile memories [ J ]. Nature, 1999, 401 : 682 - 684.
  • 6Guo D Y, Wang Y B, Yu J, et al. Effect of annealing on ferroelectfie properties of Bi3.25La0.75Ti3O12 thin films prepared by sol-gel method[J]. J Wuhan Univ Teehnol Mater Sei Ed, 2005, 20(4) : 20 -21.
  • 7Yoon S M, Lee N Y, Ryu S O, et al. Effect of ferroelectric switching time on fatigue behaviors of (117) and (001) - oriented ( Bi, La) 4 Ti3O12 fhin films [ J ]. Thin Solid Films, 2005, 484 : 374 - 378.
  • 8Wu D, Li A D, Ming N B. Leakage current characteristics of Pt/Bi3.25La0.75Ti3O12/Pt thin film capacitors[J]. J Appl Phys, 2005, 97:106 -110.
  • 9Shimakawa Y, Kubo Y, Tauchi Y, et al. Crystal and electronic structures of Bi4-xLaxTi3O12 ferroelectric materials[ J ]. Appl Phys Lett, 2001,79:2791 - 2793.
  • 10Maiwa H, Iizawa N, Togawa D, et al. Electromechanical properties of Nd - doped Bi, Ti3O12 films: A candidate for lead -free thin-film piezoelectrics[J]. Appl Phys Lett, 2003, 82:1760 - 1762.

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