摘要
Amorphous Ta_2O_5 films were prepared on Si (100) substrates by thermal oxidization.The film consisted of amorphous Ta_2O_5 nanostructure that grew vertically and compactly at a large range.It was found that Ta_2O_5 films became crystalline when annealed at or above 650℃and remained amorphous below 650℃.The effects of annealing on the optical properties of Ta_2O_5 film were also discussed.It is estimated that the refraction indexes and the optical energy gaps of both amorphous Ta_2O_5 film and crystal one are stable.The optical energy gap of as-deposited Ta_2O_5 film is about 4.81 eV.The above results indicate that Ta_2O_5 films have a promising application in the optical devices.
Amorphous TR2O5 films were prepared on Si （100） substrates by thermal oxidization. The film consisted of amorphous Ta2O5 nanostructure that grew vertically and compactly at a large range. It was found that Ta2O5 films became crystalline when annealed at or above 650℃ and remained amorphous below 650℃. The effects of annealing on the optical properties of Ta2O5 film were also discussed. It is estimated that the refraction indexes and the optical energy gaps of both amorphous Ta2Os film and crystal one arc stable. The optical energy gap of as-deposited Ta205 film is about 4.81 eV. The above results indicate that Ta2O5 films have a promising application in the optical devices.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2006年第A03期488-489,共2页
Rare Metal Materials and Engineering
