摘要
采用直流磁控溅射法制备了析氢反应的电极材料-N iFe,CoMo,研究了在1.0Pa^4.0Pa的范围内,不同溅射腔气压条件下制备的电极材料的晶粒尺寸、析氢反应的过电位与气压的关系,结果显示过电位随气压升高而降低,而且在2.0Pa处,过电位变化的程度和Tafel斜率均发生突变,表明不同溅射气压下制备的材料晶粒尺寸的变化,引起了析氢反应控制步骤的改变。
Using DC magnetron sputtering device to prepare hydrogen evolution reaction (HER) electrodes, at the rang of 1.0-4. 0Pa, catalysis electrode films of NiFe, CoMo of HER prepared at different sputtering pressure, their crystal size and HER overpotential decreased with increasing of chamber pressure, and their overpotential and Tafel slope were changed sharply at 2.0Pa. These showed that crystal size is crucial factor to the step of HER, and Tafel slope changed with it.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2006年第6期1291-1295,共5页
Journal of Synthetic Crystals
关键词
析氢电极材料
气压
过电位
晶粒尺寸
catalysis electrode films
sputtering pressure
overpotential
crystal size