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一种新型深紫外正型光致抗蚀剂材料的研究 被引量:2

Studies on a Novel Deep UV Positive Photoresist Material
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摘要 通过松香酸和丙烯酸的Diels-Alder反应得到了一种二酸———丙烯海松酸.丙烯海松酸有大的脂环结构和良好的成膜性,在固体膜层中,它可以和二乙烯基醚,如1,3-二乙烯氧基乙氧基苯,在加热条件下(80℃以上)发生反应,产物在稀碱水中难溶.这样形成的产物在光产酸剂产生的强酸催化下,在温度高于100℃时,可以迅速分解,从而变成稀碱水易溶.因此,用此二酸、二乙烯基醚和产酸剂可组成一种正型的光致抗蚀剂,当用254 nm的低压汞灯曝光时,其感度在30 mJ/cm2以下. Acrylpimaric acid, a diacid with alicyclic structure and good film-forming property, was prepared by the Diels-Alder reaction of abietic acid and acrylic acid. The diacid could react with divinyl ether, such as 1,3-divinyloxyethoxybenzene, in solid film when baked above 80 ℃ and the film became insoluble in dilute base aqueous. Thus formed compound can be quickly decomposed at the presence of strong acid generated by photoacid generator (PAG) above 100 ℃ and become easily soluble in dilute aqueous base. A positive photoresist could be formed by the diacid, divinyl ether and PAG. The measured photosensitivity is less than 30 mJ/cm^2 when exposed to low pressure Hg lamp (254 nm).
出处 《感光科学与光化学》 EI CSCD 2006年第5期377-381,共5页 Photographic Science and Photochemistry
基金 国家"十五""863"专项子课题(2002AA3Z1330-2)
关键词 正型光致抗蚀剂 二乙烯基醚 丙烯海松酸 光产酸剂 positive photoresist divinyl ether acrylpimaric acid photoacid generator
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参考文献9

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共引文献32

同被引文献19

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