摘要
讨论等离子体刻蚀及其等离子体源在微电子工业中的作用,介绍四种高效等离子体源,并讨论这一领域亟待解决的问题。
In the present paper, the functions of plasma etch and plasma sources are discussed. Four enhanced plasma sources are introduced and some being attacked problems are presented.
出处
《中国科学基金》
CSCD
1996年第1期31-35,共5页
Bulletin of National Natural Science Foundation of China
关键词
等离子体源
亚微米刻蚀
微电子技术
plasma sources, sub-micrometer etch, challenge problems
