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直流溅射电致变色NiO_xH_y膜的研究 被引量:1

THE STUDY OF DC SPUTTERED-DEPOSITED ELECTROCHROMIC NiO_xH_y THIN FILM
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摘要 采用直流溅射Ni(OH)2粉末压实靶制作了电致变色膜.介绍了制膜工艺,用XRD谱研究了着色前、后膜的结构,XPS谱研究Ni、O的结合.谱响应特性和电化学特性表明,膜的电色活性良好. hin films of nickel oxide were prepared by DC sputtering of nickel hydrooxide powder-pressed target in Ar(or Ar+O2) gas. The process is presented in this paper.SEM and XPS were employed to investigate the microstructure of the film and identify its chemical composition. The electrochemical and optical properties of the films were determined by the cyclic voltammetry, spectral transmittance. Our results indicate that the a-NiOxHy thin films have good electrochromic characteristics.
出处 《发光学报》 EI CAS CSCD 北大核心 1996年第1期56-63,共8页 Chinese Journal of Luminescence
基金 国家自然科学基金
关键词 电致变色 直流溅射 NiOxHy膜 electrochromism, DC sputtering, NiO_xH_y
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