摘要
本文总结了目前制备二氧化硅基波导薄膜的各种制备工艺,包括广泛采用的等离子增强化学气相沉积法(PECVD)和火焰水解法(FHD)以及低压化学气相沉积法、溅射法、离子交换法、离子注入法和溶胶—凝胶法等制备方法,并对各种工艺的原理、特点和应用现状进行了详细的介绍。
Several typical fabrication methods of silica based waveguide film, such as plasma enhanced chemical vapor deposition method,the flame hydrolysis method,the low pressure CVD,sputtering,ion exchange,ion implantation, sol-gel method,are reviwed. The processes, characteristics and the application of the methods are also introduced respectively.
出处
《山东陶瓷》
CAS
2006年第3期17-19,共3页
Shandong Ceramics
关键词
二氧化硅基波导薄膜
制备工艺
Silica Based Waveguide Film
Preparation Craft
Summary
