摘要
研究了照明光瞳非对称性对光刻成像质量的影响。通过PROLITH软件计算了环形与四极照明条件下,光瞳非对称性对图形位置偏移量、曝光图形内水平线条与垂直线条的宽度差、曝光图形上密集线条与孤立线条之间线宽偏差的影响。研究结果表明,光瞳非对称性主要影响曝光图形的位置偏移量,光瞳非对称性引起的图形位置偏移量与光瞳非对称性的大小成线性关系。根据套刻精度的误差分配原则,计算得到光瞳非对称性的容限为5%。
The impacts of pupil filling unbalance on image CD placement error, H-V bias （the size difference between the vertical lines and the horizontal lines） and I-D bias （the size difference between the isolated lines and the dense lines） are calculated using software PROLITH under annular and quardupole illumination settings. Calculations show that the main effect of pupil filling unbalance on imaging performance of lithography is the image CD placement error. The image CD placement error caused by pupil filling unbalance is proportional to the pupil filling unbalance. The tolerance of the pupil filling unbalance of 5 % is achieved according to the budget of the overlay accuracy.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2006年第6期885-890,共6页
Acta Optica Sinica
基金
国家863计划(2002AA4Z3000)资助课题
关键词
仪器
光刻
光刻仿真
离轴照明
光瞳非对称性
instrument
optical lithography
lithography simulation
off-axis illumination
pupil filling unbalance
