摘要
研究了次亚磷酸盐溶液电镀三价铬工艺的溶液化学性质，对镀液中三价铬离子与次亚磷酸根离子的配位化合物进行了探讨。用线性电势扫描法、循环伏安法研究了镀液的电化学特征及镀液中氟离子、次亚磷酸根离子、溶液ｐＨ值对阴极析氢反应的影响。
The properties of solution chemistry for the process of trivalent chromium plating containing hypophosphite have been investigated. The coordination compounds between trivalent chromium ions and hypophosphite ions have also been discussed. By means of potentiodynamic scanning and cyclic voltammetry,effects of electrochemical characteristics and hydrogen evolution on bath components have been studied.
出处
《中国有色金属学报》
EI
CAS
CSCD
1996年第2期28-31,共4页
The Chinese Journal of Nonferrous Metals
关键词
三价铬
电镀
电化学
次亚磷酸盐
溶液
trivalent chromium plating inert ligand hydrogen evolution
