摘要
采用阴极电弧沉积方法，制备了与靶材成分基本相同的多元合金Inconel625膜层[1]。用XRD，SEM，TEM研究了不同入射角下所获膜层中的织构分布及其成因。
A 12-component alloy Inconel 625 film was prepared by cathodic arc plasma deposition (CAPD) technology. The chemical composition of the film was found to be consistent with that of Inconel 625 cathodic target. The methods of XRD,SEM and TEM were used to investigate the film orientation and its formation at different particle incident angles. The conclusions are as follows: (1 ) the preferential growth along (111) direction dominated the whole growth process of the film,which can be explained by the statistic of the condensation orientation of every droplet which formed the film; (2)the orientation po1ar density of (111 ) decreased as the incident angle between the particle beam and the substrate surface increased,and this can be explained by the composition of plasma temperature field vector and the substrate cooling temperature field vector.
出处
《真空科学与技术》
CSCD
1996年第3期151-154,共4页
Vacuum Science and Technology
