摘要
采用直流电镀结合正胶光刻工艺制备了Fe21Ni79／Cu／Fe21Ni79三明冶薄膜，并在0．1-40MHz范围内研究了它的纵向巨磁阻抗效应特性。实验结果表明，Fe21Ni79／Cu／Fe21Ni79三明治薄膜有十分明显的纵向GMI效应，GMI先随外加磁场的增高而迅速增大，在Hext=0.96kA／m达到最大值后开始逐渐下降．在频率为1．2MHz，外加磁场为0．96kA／m时薄膜的纵向GMI最大值达到88．3％．
Fe21Ni79/Cu/Fe21Ni79 sandwiched films were prepared by DC-electroplating incorporated with positive photoresist lithography technique on glass substrate. The longitudinal giant magneto-impedance （GMI） was measured in the frequency range of 0. 1-40MHz. The results show that Fe21Ni79/Cu/Fe21Ni79 sandwiched films exhibit obvious longitudinal GMI, and the longitudinal GMI increases rapidly with increasing applied field Hext, reaching a positive maximum at Hext=0.96kA/m, and then decreases with further increasing Hext. In addition, the maximum longitudinal GMI of 88.3% occurs at the frequency of 1.2MHz and Hext=0.96kA/m.
出处
《磁性材料及器件》
CAS
CSCD
2006年第2期14-17,共4页
Journal of Magnetic Materials and Devices
基金
国家自然科学基金项目(50275096)
上海市纳米专项资助项目(0352nm014)
教育部科学技术研究重大项目资助项目(重大0307)
