期刊文献+

正性小分子光刻胶的制备探索 被引量:1

Study on Prepare of Positive Micromolecule Photosensitizer
在线阅读 下载PDF
导出
摘要 以硬脂酸、邻硝基苄醇为原料,合成了硬脂酸邻硝基苄酯,并在高压汞灯下曝光、显影,证明了以邻硝基苄醇作为光敏基元制备正性小分子光刻胶的可行性。 Stearic acid 2-nitrobenzyl esters is synthesized with stearic acid and 2-nitrobenzyl alcohol. Then it is exposured under HP mercury lamp and developed by 20% NaOH solution, which proves the feasibility of preparing positive micromolecule photosensitizer using 2- nitrobenzyl alcohol as photosensitive module.
出处 《四川理工学院学报(自然科学版)》 CAS 2006年第2期105-107,共3页 Journal of Sichuan University of Science & Engineering(Natural Science Edition)
关键词 硬脂酸 邻硝基苄醇 正性小分子光刻胶 stearic acid 2-nitrobenzyl alcohol positive micromolecule photosensitizer
  • 相关文献

参考文献5

二级参考文献18

  • 1黄志齐 穆启道 等.电子化学品,第一、三章[M].北京:化学工业出版社,2001..
  • 2孙世铭 穆启道.化工材料咨询报告 第九章[M].北京:中国石化出版社,1999..
  • 3..SEMI STANDARDS(Process Chemicals Volume)SEMI-C1、C7、C8、C1 2-2002[S].,2002..
  • 4.全球半导体厂商生产基地[N].电子资讯时报,2003-3-20.
  • 5[1]CREMERS C, BOUAMRANE F, SINGLETON L, et al. SU-8 as resist material for deep X-ray lithography [J]. Microsystem Technologies 2001,7 (1):11-16.
  • 6[2]LORENZ H, DESPONT M, VETTIGER P, et al. Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist [J]. Microsystem Technologies 1998,4 (3):143-146.
  • 7[3]LEE K Y, LABIANCA N, RISHTON S A, et al. Micromaching application of a high resolution ultrathick photoresist [J]. J Vac Sci Technol B,1995,13(6).
  • 8[4]DESPONT M, LORENZ H, FAHRNI N, et al. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications [A]. Proc of the 10th Int IEEE Workshop on Micro Electro Mechanical Systems [C]. Nagoya, Japan, 1997, 518-522.
  • 9SEMI STANDARDS (Process Chemicals Volume)SEMI-C1, C7, C8, C12-2002[S].
  • 10黄志齐 穆启道.电子化学品,第一、三章[M].北京:化学工业出版社,2001..

共引文献26

同被引文献11

引证文献1

二级引证文献4

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部