摘要
采用溶胶-凝胶法分别在普通玻璃和石英玻璃基底上制备出性能优良的ZnO薄膜,并通过XRD、AFM和UV-V is吸收光谱对薄膜进行表征,进一步研究了不同波长紫外光照射、不同基底及不同退火温度对薄膜光催化性能的影响。实验结果表明,以石英为基底,退火温度为400℃的ZnO薄膜具有更好的光催化氧化能力,并且实现了催化剂的固载,便于回收再利用,催化效果显著。
Highly photoactive ZnO thin films on glass substrates and quartz substrates were prepared by sol-gel process. Structural features, surface morphology and UV absorption spectrum were studied by XRD, AFM and UV- Vis-Nir scanning spectrophotometer. The influence of wave lengths of the UV used in photocatalysis, film substrates, and different annealing temperatures on degradation rates also was analyzed. The results show that the ZnO thin films prepared on quartz substrates, annealed at 400 ℃ have higher degradation rates. Excellent adhesion as well as being recyclable and efficient in phenol degradation of ZnO thin films were found in the experiment.
出处
《化学工程》
CAS
CSCD
北大核心
2006年第3期39-42,共4页
Chemical Engineering(China)
基金
广东省自然科学基金资助项目(031921)
