摘要
用掠入射X射线衍射及X射线反射对磁控溅射制取的等原子比Ni/Ti周期性多层膜晶化热处理后的TiNi形状记忆薄膜室温微结构进行了研究.TiNi形状记忆薄膜在深度方向的相分布和元素分布是不均匀的,都是一种多层结构.室温下其微结构特征为最外层是Ti氧化膜,再下层是Ti3Ni4,B19’马氏体相和少量的B2奥氏体相的三相混合物,靠近基体为主要相成分马氏体,最后是Ni和Si界面反应层.X射线反射率的拟和结果显示薄膜微结构的分析是合理的.薄膜中相深度分布的不均匀性主要是动力学因素决定的.
Phase depth profile in TiNi shape memory alloy films is studied by the combination of grazing-incidence X-ray diffraction and X-ray reflectivity measurement. The film is made from sputter-deposited Ni/Ti multilayers. At room temperature, both the phase depth profile and element depth profile are not uniform, and both have multilayer structure. There is a three-phase mixture region consisting of Ti3 Ni4 precipitates, martensite and a little of austenite near the free surface. A uniform martensite phase is formed near the substrate. Diffusion and reaction take place between film and substrate. The simulation result of X-ray reflectivity shows that the results of film microstructure analysis are reasonable. It is the kinetic factors that mainly cause the ununiformity of phase depth profile in the film.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2006年第3期1508-1511,共4页
Acta Physica Sinica
基金
高能所科技创新项目(批准号:U-513-1)资助的课题.~~
