摘要
本文报道在氮氧混合气体中用射频反应溅射法在硅表面成功淀积氮氧铝膜的实验研究结果。给出膜淀积工艺、膜的原子组元和浓度、含有不同氧原子浓度的膜的折射率和击穿电场强度以及膜的X-光衍射谱。
The experimental study of aluminum oxynitride film deposited on Silicon surface by
radio frequency reactive sputtering method in a mixture of forming nitrogen anl oxygen gases
is reported.The depositing Process, atomic Components and its concentrations, refractive index
and breakdown electric field of the depositied films with different oxygen atomic concentrations
have been determined. The X-ray d ffraction patters of the film are also given.
