摘要
用循环伏安法通过改变ＫＯＨ浓度及改变电位扫速等研究了ＫＯＨ介质中银电极表面上ＡｇＯ的形成，着重探讨了电位负扫方向上出现倒峰的条件，采用原位Ｘ－射线技术进行表征．研究结果表明，这一倒峰的出现与ＫＯＨ浓度、电位扫速等因素有关，该峰代表了ＡｇＯ继续生成的阳极氧化峰．
The GLC study on the themodynamic properties of adduct formation reaction of Ni[(C 8H 17 O) 2PS 2] 2 and Cyclopentanone was reported. The equilibrium constants in the range of 333.2-363.2K were determined and described by the empirical equation:lg K=-4.544+1518/T △rH m and △rS m were calculated by the least square method.
出处
《南京师大学报（自然科学版）》
CAS
CSCD
1996年第3期49-51,共3页
Journal of Nanjing Normal University(Natural Science Edition)
基金
江苏省教育委员会自然科学基金
关键词
原位技术
氧化银
银
碱性介质
X射线衍射
Gas-Liquid Chromatography, Acid-Base adduct, Thermodynamic Parameters, Dialkyldithio phosphate, Cyclopentanone
