摘要
利用分子自组装技术,在磁头表面制备1H,1H,2H,2H-全氟葵烷基三乙氧基硅烷(FTE)自组装膜。应用时间飞行二次离子质谱仪(TOF-SIMS)、原子力显微镜(AFM)和接触角测量仪对FTE自组装膜进行表征。通过O lympus磁头磁盘界面可靠性测试系统对FTE自组装膜的摩擦学性能进行研究。实验结果表明磁头表面可制备膜厚1.2 nm、接触角值110.6°、表面粗糙度0.198 nm的FTE单层自组装膜。FTE单层自组装膜能够降低磁头起停过程的粘着力、增强磁头的摩擦性能,具有良好的耐磨性能。
A self-assembled monolayers （ SAMs ） of I H, 1 H,2 H, 2 H-perfluorodecyltriethoxysilanes （ FTE ） was prepared on the magnetic head by the self-assembly of silane with hydroxyl group on the substrate. The FTE SAMs was characterized by the time-of-flight secondary ion mass spectrometer （TOF-SIMS）, atomic force microscopy （AFM） and contact angle measurement, and the tribology properties of the FTE SAMs were measured by the Olympus head/disk interface reliability measurement system. The experimental results show that a FTE SAMs, with a thickness of 1.2 nm, water contact angle of 110. 6° and Ra value of 0. 198 nm, can be prepared on magnetic head surface. Having good durability property, the FTE SAMs decreases the stiction of the magnetic head in contact start stop （CSS） process, and leads to considerably improved friction property of the magnetic head surface.
出处
《润滑与密封》
CAS
CSCD
北大核心
2005年第6期1-3,27,共4页
Lubrication Engineering
基金
国家自然科学基金重大项目资助(50390060)
