摘要
Nickel phosphorous amorphous film catalyst was prepared by means of electrodeposition on p-type silicon. Effects of H3PO3 content in bath and current density on phosphorous content in the film were studied. With the increase of H3PO3 concentration and the decrease of current density, P content was increased remarkably, X-ray dtheaction (XRD) showed that the film containning x (molar fraction)=0.109 P is amorphous.Scanning electrouic microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) wereused to investigate the morphology of the film and the chemical state of Ni, P, O on thesurface.
Nickel phosphorous amorphous film catalyst was prepared by means of electrodeposition on p-type silicon. Effects of H3PO3 content in bath and current density on phosphorous content in the film were studied. With the increase of H3PO3 concentration and the decrease of current density, P content was increased remarkably, X-ray dtheaction (XRD) showed that the film containning x (molar fraction)=0.109 P is amorphous.Scanning electrouic microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) wereused to investigate the morphology of the film and the chemical state of Ni, P, O on thesurface.
出处
《物理化学学报》
SCIE
CAS
CSCD
北大核心
1996年第5期436-439,共4页
Acta Physico-Chimica Sinica
基金
国家自然科学基金
关键词
催化剂
电沉积
镍
磷
非晶薄膜
p-Si, Amorphous, Ni-P, Catalyst, Electrodeposition
