摘要
利用噻吩原位吸附红外光谱、常压连续固定床反应等研究手段,结合吡啶吸附程序升温脱附红外光谱、XPS光电子能谱等表征手段对噻吩与五氧化二钒的反应机理进行了初步研究。研究发现:500℃下,噻吩能够与V2O5发生氧化还原反应,噻吩被氧化成CO、CO2以及SO2,转化率可达到41.2%,同时V2O5的氧化数下降。V2O5表面存在少量B酸中心,这一特征使噻吩的反应产物中H2S的产率增加。
The reaction mechanism of thiophene on vanadium oxides under FCC conditions were studied using thiophene in-situ FT-IR analysis and atmospheric pressure continuous fixed bed reaction, following characterization by pyridine adsorption-temperature programmed desorption FT-IR and XPS spectrum. The test results showed that redox reaction occurred between thiophene and V2O5 at 500℃; thiophene was converted to CO, CO2 and SO2 and the conversion reached 41.2%; at the same time the oxidation number of vanadium decreased. The existence of a few Bronst acid sites on V2O5 enhanced the formation of H2S in the reaction of thiophene with V2O5.
出处
《石油炼制与化工》
CAS
CSCD
北大核心
2005年第7期41-45,共5页
Petroleum Processing and Petrochemicals
基金
国家重点基础研究基金资助项目(G2000048001)
