摘要
目的研究多导人工耳蜗植入后电极阻抗变化的特点,对比直电极和弯电极的阻抗差异,为人工耳蜗植入术后的调试提供参考。方法在Nucleus多导人工耳蜗编程调试界面上,应用R126V1.3和NRTV3.0软件,测试11例语前聋儿童在不同时期的阻抗值,并进行分析比较。结果CI24M和CI24Rcontour两种植入体阻抗随时间变化的基本规律是:术中较低,开机时最高,以后随时间推移逐渐降低。CI24Rcontour阻抗高于CI24M。结论人工耳蜗植入体阻抗开机后随时间推移而逐渐降低,新型CI24Rcontour植入体与CI24M相比,其阻抗值在术中至开机后3周内明显要高。
Objective To observe the changes in impedance of electrodes after embedding implants, and to compare the impedance of straight electrode array with spiral electrode array. Methods By means of the programming interface of Nucleus multichannel cochlear implants, the impedance of electrodes was measured during the operation, at initial stimulation, and at each mapping visit of following 3 weeks, using softwares R126 V1.3 and NRT V3.0. Eleven prelingual deafness children implanted with Nucleus devices participated in the study. Results The changes in impedance of both CI24M and CI24R contour occurred as time passed： the electrodes impedance increased significantly from the intra-operation test to initial stimulation, and decreased gradually from initial stimulation to the following visits. The reduction remained stably for three weeks after initial stimulation for the straight electrode of CI24M. Conclusion The electrode impedance of cochlear implant decreases after initial stimulation as time goes on. There is a significant increase in electrode impedance of new implantation device of CI24R contour compared with CI24M.
出处
《中国耳鼻咽喉颅底外科杂志》
CAS
2005年第4期240-242,共3页
Chinese Journal of Otorhinolaryngology-skull Base Surgery
基金
国家自然科学基金(No.30271404)
国家973(No.2001CB510302)
湖南省卫生厅(No.B2004-020)项目资助。
关键词
人工耳蜗
耳蜗植人物
耳蜗微音电位
Cochlear implants, cochlear implant
Cochlear microphonic potentials
