摘要
在相同的曝光和显影条件下，用Ｄ－１９和Ｐｈｅｎｉｓｏｌ两种显影液定性比较了ＳＩＯＦＭ－５ＦＷ底片、Ｋｏｄａｋ１０１－０５和Ｉｌｆｏｒｄ－Ｑ板在１００．０ｎｍ以下的软Ｘ射线和ＸＵＶ波段范围里的曝光特性．比较实验表明，ＳＩＯＰＭ－５ＦＷ底片对波长大于１０．０ｎｍ的辐射的响应介于Ｋｏｄａｋ１０１－０５和ＩＩｆｏｒｄ－Ｑ板之间；对于１０．０ｎｍ以下的短波长区，ＳＩＯＰＭ－５ＦＷ比Ｋｏｄａｋ１０１－０５灵敏，而且有较高的饱和光密度值和动态范围，但存在明显的碳Ｋ吸收边结构。讨论了所用的两种显影液对底片曝光特性的影响。
Under identical exposure and Processing conditions, the exposure characteristics of the soft X-ray film SIOFM-5FW have been compared qualitatively with Kodak 101- 05and Ilford-Q plates in the soft x-ray and XUV ranges below 100. 0 nM, using D-19 and Phenisol developers. The experimental results have shown that for the radiation above 10. 0nm, the response of SIOFM-5FW lies between Kodak101-05 and Ilford-Q plate,but closely to the former and for the radiation below 10. 0 nm SIOFM-5FW is more sensitive than Kodak 101-05 plate, with a higher saturation density and dynamic range, and has an obvious K absorption eadge structure of carbon. The effects of the two developers on the exposure characteristics are discussed.
出处
《中国激光》
EI
CAS
CSCD
北大核心
1995年第8期584-588,共5页
Chinese Journal of Lasers
