摘要
用B^+、F^+离子束曝光PMMA,实验得到灵敏度为(1-8)×10^(12)离子/厘米~2,饱和曝光深度t由能量损失的深度分布范围决定,且t≌R_p+2△R_p,阈值能量8_m=(30-330)焦耳/厘米~3,并估算了本实验条件下离子束曝光PMMA的分辨率d～(25-100)纳米.XPS分析结果表明,在剂量D>1×10^(13)离子/厘米~2时,PMMA表层中含氧量才显著减少,由此推想在离子束曝光常用剂量范围内,PMMA发生降解反应时并不伴随含氧侧基的脱落.
Ion-Beam exposure of PMMA has been investigated with ions B^+ (60-120 KeV) and F^+(30-110 KeV). The Measurements of the saturation exposure depth and the resist sensitivityversus ion energies are presented.The dependence of the saturation exposure depth on ion ran-ge distribution, the threshold energy for complete exposure,and the lateral resolution based oncalculated range straggling are given under our experimental conditions.Using XPS method,the content of oxygen was found unchanged at regular dose,but, it decreased remarkably whenthe dose D>1×10^(13) ions/cm^2, from such a phenomenon, we suppose that the scission reactionmay take place in PMMA without the separation of oxygen group in the regular dose range ofion beam exposure.
基金
国家教委基金
关键词
离子束
曝光
抗蚀剂
灵敏度
PMMA
Ion beam
Exposure
Resist sensitivity
Polymer
Energy deposition
Ion range
Energy loss
