摘要
本文介绍了为我校新型电子束曝光机所研制的30kV 高稳定度高压电源。该电源采用双闭环调整,集中补偿和分散补偿相结合的设计方案,满意地解决了静态精度和动态稳定性的矛盾。针对高压稳压电源的技术特点,对关键技术进行了适当处理,使各项技术指标均达到或超过原设计要求。
This paper recommends a high stability regulated power supply with 30kV high voltage.The power supply provides for a new type electron beam exposure machine developed by Shandong Polytechnic University.It adopts design scheme of donble closed loop regulation and design scheme of centralized compensation combin- ed with dispersed compensation.In accordance with the technical requirements of regulated power supply its key techniques have been properly handled.All its qua- lifications satisfy,or exceed the original design requirements.
出处
《电工技术学报》
EI
CSCD
北大核心
1989年第1期45-50,共6页
Transactions of China Electrotechnical Society
关键词
电子束曝光机
高压电源
高稳定度
Power supply
High voltage
Electron beam
High stability
