摘要
对真空渗氮的工艺进行了初步的研究,发现真空渗氮层具有与其它渗氮层相似的组织和性能,但渗氮速度较普通气体渗氮提高一倍以上.在试验的基础上分析了真空渗氮的一些特点,并与普通气体渗氮和离于渗氮进行了比较.
In this paper, the vacuum nitriding processes was studied primarily. The results show that the vacuum nitriding layer has similar structure and properties to other nitriding layers ,but nitriding rate was accelerated by one time than that of gas nitriding. some characteristics of vacuum nitriding were analyzed and the comparison with gas nitriding and ion nitriding was carried out.
出处
《金属热处理》
EI
CAS
CSCD
北大核心
1995年第11期17-19,共3页
Heat Treatment of Metals
