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飞行时间二次离子质谱结合X-射线光电子能谱分析化学清洗后残留的表面有机物 被引量:1

Characterization of the Residual Surface Organic Contaminants After Chemical Rinse by Time-of-flight Secondary Ion Mass Spectrometry and X-Ray Photoelectron Spectroscopy
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摘要 用飞行时间二次离子质谱(TOF-SIMS)结合X射线光电子能谱,分析了用化学方法清洗后银片上残留的未知有机物.TOF-SIMS与XIPS提供的互补的表面信息显示,中分子量以上的有机物主要是几种链长22~27碳原子、碳链饱和度很高的多酮类化合物,可能还有一些多酯类化合物.这些有机物中的C=O基团易于采取氧原子指向金属基体表面的取向,通过带部分负电荷的氧原子与金属基体镜像力的作用而增强粘附. Complementary surface information drown from time-of-flight secondary ion mass spectrometry and X-ray photoelectron spectroscopy was used to characterize the residual organic contaminants on the surface of silver foil after certain chemical rinse. The most pronounced organic contaminants with medium and higher molecular mass were characterized as multi-ketones, and multi-esters probably, with highly saturated backbones of 22 to 27 carbon atoms. In such a structure, a preferential orientation of C = O groups with oxygen atoms pointing to the metal substrate may occur easily as a result of the interaction between the partially charged oxygen atoms and their mirror image force in the substrate, resulting in an enhanced adhesion.
出处 《分析化学》 SCIE EI CAS CSCD 北大核心 1995年第9期1102-1106,共5页 Chinese Journal of Analytical Chemistry
关键词 质谱 有机沾污 XPS Time-of-flight secondary ion mass spectrometry X-ray photoelectron spec-troscopy organic contaminant
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