摘要
随着大规模集成电路技术的发展,采用化学腐蚀的方法制备硅尖阵列及其二极管在真空微电子学中已被广泛采纳和应用。本文简要叙述了在各向同性腐蚀和各向异性腐蚀下硅尖形成的基本理论,讨论了硅尖形成的常用方法及其相关技术,扼要地介绍了硅尖阵列及其二极管制备过程中涉及到的重要工艺(如氧化锐化、平面化技术、静电键合和自对准工艺)。
With the development of large scale IC,silicon tip arrays and their diodes fabricated by chemical etch methods are extensively used in the vacuum microelectronics. The basic theory of tips formation on the silicon substrate using isotropic or anisotropic etch solutions is described. The conventional fabrication techniques of silicon tip arrays and their relerant technol- ogy are discussed.Some important techniques being used to fabricate silicon tip arrays and diodes are introduced.
出处
《光电子技术》
CAS
1994年第3期204-210,共7页
Optoelectronic Technology
关键词
二极管
场致发射阴极
硅
vacuum microelectronics
silicon tip arrays
field emission
isotropic/anisotropic etch solution
