摘要
载玻片上浸涂一层常温常压合成的SiO2溶胶后再浸涂TiO2溶胶制备预涂SiO2的TiO2薄膜光催化剂,结果发现浸涂一层SiO2会诱导金红石相TiO2生成,并使TiO2光催化活性提高71.75%,但预涂二层SiO2的TiO2薄膜仅有锐钛型且光催化活性较纯TiO2薄膜降低。这说明适量金红石型/锐钛型的混晶型TiO2具有更好的光催化活性。对TiO2微结构分析显示,TiO2薄膜点阵应变越大,薄膜光催化性能越好。X射线光电子能谱研究表明,预涂一层SiO2的TiO2薄膜Ti3+含量较纯TiO2薄膜高,预涂二层SiO2的TiO2薄膜Ti3+含量较纯TiO2薄膜低。扫描电镜分析说明,预涂SiO2的TiO2薄膜表面颗粒粒径较纯TiO2薄膜更小,薄膜颗粒粒径与光催化活性不是简单的一一对应关系。
TiO2 thin films smeared SiO2 sol on slide glass substrates one coating cycle time, which improved the photocatalytic activity up to 71.75%. X-ray diffraction (XRD) analysis indicated that the thin films induce the formation of rutile. But TiO2 thin films precoated SiO2 with two coating cycle times were anatase and the photocatalytic activity was decreased. TiO2 thin films with complex crystal phase of rutile/anatase suitable ratio have good photocatalytic activity. That has more lattice stress and it will possess more photocatalytic activity. X-ray photoelectron (XPS) analysis indicated that content of Ti3+ increased apparently when TiO2 thin films precoated SiO2 with one coating cycle time, and content of Ti3+ decreased when TiO2 thin films precoated SiO2 with two coating cycle time. Scanning Electron Microscope (SEM) indicated that precoated SiO2 can suppress the grain growth of crystals in the TiO2 thin films.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2005年第6期927-929,共3页
Journal of Functional Materials
关键词
TIO2薄膜
预涂SiO2
光催化活性
微结构
Coatings
Grain growth
Microstructure
Morphology
Photocatalysis
Scanning electron microscopy
Semiconducting films
Silica
Surface treatment
Thin films
X ray photoelectron spectroscopy
