摘要
综述了二元光学元件的常用制作工艺技术,包括台阶刻蚀法、薄膜沉积法、直接写入法、准分子激光加工法和灰阶掩模法。分析了这些方法的优缺点,并对其制作技术的发展进行了评述。
The common fabrication technologies of binary optical elements were expatiated, including etching, thin-film deposition, direct writing, excimer laser projection and gray-scale masks. The merit and defect of these technologies were analyzed, and the development of fabrication technology were summarized.
出处
《光学仪器》
2005年第2期80-85,共6页
Optical Instruments
关键词
二元光学
制作工艺
刻蚀
直写法
binary optics
fabrication technology
etching
direct writing
