摘要
采用脉冲激光烧蚀技术在氩气环境下制备了纳米硅薄膜,研究了环境气体压强对纳米硅薄膜表面形貌的影响.结果表明,当环境气压小于50Pa时,薄膜表现为常规的量子点镶嵌结构;当环境气压大于50Pa时,薄膜中出现类网状的絮结构,继续增大氩气压,絮结构逐渐增大,且其隙度增大.指出该现象与在激光烧蚀过程中纳米硅团簇的形成过程有关.
In argon (Ar) gas, nanocrystalline silicon films are prepared by pulsed laser ablation. The influence of ambient pressure on surface morphology of nanocrystalline silicon film is studied. The results show that quantum dots inserted into the films are obtained when the pressure is lower than 50 Pa, which is the ordinary microstructure; Web_like aggregation of particles is formed when the ambient pressure is higher than 50 Pa; With the ambient pressure increasing further ,web_like aggregation enlarge and its porosity increase. This phenomenon is related to the peculiarities of the clusters formation during the laser_ablation process.
出处
《河北大学学报（自然科学版）》
CAS
北大核心
2005年第1期29-32,共4页
Journal of Hebei University(Natural Science Edition)
基金
河北省自然科学基金资助项目(500084
503125)
关键词
脉冲激光烧蚀
纳米硅
形貌
pulsed laser ablation
Si nanoparticles
morphology
