摘要
本文研究了钛离子注入对铁和镍在０．５ｍｏｌ／ＬＨ２ＳＯ４和醋酸／醋酸钠水溶液（ｐＨ＝５）中电化学腐性行为的影响．离子注入剂量为１×１０１７离子·ｃｍ（－２）．用动电位扫描法测量了注入试样的电流密度－电位曲线，与末泣入的基体进行了比较．钛离子注入使腐蚀电位正移，极化电阻增大，腐蚀电流减小．在泣钛的铁和镍表面进行ＡＥＳ分析表明，钛在铁和镍中的浓度分布近似Ｇａｕｓｓ分布．钛离子注入对基体腐蚀速度的影响可能与钛和基体金属之间的表面合金化作用有关．
Abstract The influence of titanium ion implantation on the electrochcmical corrosion behavior of Feand Ni in 0.5mol/ L HZSO4 or sodium acetate/ acetic acid aqueous solutions (pH= 5) wasStudied. Fo' and Ni substrates were bombarded with I x 1017ions cmZof Ti. The currentdensity-potential curves of the implanted samples were measured by means of potontiliineticsweep and compared with that of unimplanted substrates. Titanium ion implantation leads tonobler corrosion potential, enhanced the polarization resistance, depressed the corrosioncurrent.AES analysis on sulface Fo and Ni ho planted with Ti indicate that the depth distrbutionof Ti in Fe or Ni are approximately Gauss profiles. The influence of titanim ion implantation onthe corrosion rate of substlates may be related to surface alloying effect between the implantedtitanium and the metal substrate.
基金
国家自然科学基金
