摘要
研制了一套功率容量大、结构合理、工作稳定的微波等离子体ＣＶＤ系统。描述了系统的基本结构和性能，讨论了它的特点。作者利用该系统，在单晶Ｓｉ等衬底材料上成功地合成了金刚石薄膜。
Amicrowave plasma CVD system,which has high power capability,reasonable configuration and oper-ates stably,has been developed.In this paper,the basic configuration and performance of the system aswell as its features are described.Using this system,a synthesis of diamond film on various substratessuch as single crystal silicon has been achieved successfully.
出处
《航空材料学报》
CAS
CSCD
1994年第3期42-47,共6页
Journal of Aeronautical Materials
