摘要
在追述以往的判断薄膜微结构的结构区模型（ｓｔｒｕｃｔｕｒｅｚｏｎｅｍｏｄｅｌｓ）的基础上，整理和介绍了国外最近提出的结构区模型。它是以离子复合参数Ｅ＿ｐ（由到达的离子带给凝聚粒子的平均能量ｅＶ／ａｔｏｍ）为参变量，衡量该参数对薄膜微结构及其特性的影响，对今后设计ＰＶＤ设备和更好地掌握工艺条件，将会是有益的。
Physical vapor deposition(PVD)methods have found widespread appli-cation the deposition of hard coatings. In order to compare potential and limi-tations of the PVD methods, a good knowledge of the physical processes offilm growth, formation of various film microstructures, and the resultingproperties iS necessary. Here the latest advances in understanding the ef-fect of physical film growth parameter on the microstructure of growingfilms are reviewed.Examples of sputtered TiN film microstructure are given.A critical review of the structure zone models is presented.
出处
《电工电能新技术》
CSCD
北大核心
1994年第4期11-18,共8页
Advanced Technology of Electrical Engineering and Energy
关键词
物理气相沉积
薄膜
结构区模型
physical vapor deposition, film structure zone models
