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高频介质阻挡放电烟气脱硫研究 被引量:10

Study of the Desulfurization by High Frequency Dielectric Barrier Discharge
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摘要 采用高频介质阻挡放电的方式产生低温等离子体 ,研究在不加入NH3 的情况下流动态SO2 的去除情况 .实验表明 ,在输入电压为 12kV ,SO2 浓度为 5 40 0mg/m3 ,气体流量为 0 3 6m3 /h ,相对湿度为 5 5 %时 ,脱硫率可达到 70 %以上 ;水气的存在对SO2 的去除有较大的促进作用 ,升高电压和增加O2 量对脱硫率的促进作用有限 .对实验结果进行了解释 。 The removal of flowing SO2 was studied in the absence of NH3 by cold plasma generated by high frequency dielectric barrier discharge. The results showed that the decomposition rate was over 70% at the experimental conditions of 12 kV input voltage and 55% relative humidity with the SO2 concentration of 5400 mg/m(3) and the gas flux of 0.36 m(3)/h. The added H2O(g) played an important role in the SO2 removal, and in addition, the increasing O-2 and input voltage exerted a little influence on the decomposition rate of SO2. The desulfurization mechanism was also discussed under the analysis of experimental results.
出处 《化学学报》 SCIE CAS CSCD 北大核心 2004年第23期2308-2312,共5页 Acta Chimica Sinica
关键词 SO2浓度 烟气脱硫 脱硫率 去除 介质阻挡放电 低温等离子体 NH3 MG/M^3 升高 促进作用 dielectric barrier discharge desulfurization flowing cold plasma
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  • 1Zhang, Z.-T.; Bai, X.-Y.; Leng, H.; Bai, M.-D. Chin. J. Environ. Engineer. 1998, 16, 35 (in Chinese).(张芝涛, 白希尧, 冷宏, 白敏 , 环境工程, 1998, 16, 35.)
  • 2Li, R.; Yan, K.; Miao, J.; Wu, X. Chem. Engineer. Sci. 1998, 53, 1529.
  • 3Zhu, Y.; Chae, J. O.; Kim, K. Y.; Park, Y. K. Plasma Chem. Plasma Process. 2002, 22, 187.
  • 4Wu, Y.; Wang, N.-H.; Li, J.; Li, G.-F.; Zhang, Y.-B. The 8th National Atmospheric Environment Conference, Kunming, 2000, p. 458 (in Chinese).(吴彦, 王宁会, 李杰, 李国锋, 张彦斌, 第八届全国大气环境学术会议论文集, 昆明, 20
  • 5Zhao, J.-K.; Wang, B.-J.; Ren, X.-W.; Mao, B.-J.; Zhu, Y.-Q.; Zhu, Z.-L. Chin. J. Environ. Engineer. 2001, 19, 43 (in Chinese).(赵君科, 王保健, 任先文, 毛本将, 朱永全, 朱主良, 环境工程, 2001, 19, 43.)
  • 6Dhali, S. K.; Sardja, I. J. Appl. Phys. 1991, 69, 6319.
  • 7Chang, M. B.; Balbach, J. H.; Rood, M. J.; Kushner, M. J. J. Appl. Phys. 1991, 69, 4409.
  • 8Ma, H.; Chen, P.; Zhang, M. L.; Lin, X. Y.; Ruan, R. Plasma Chem. Plasma Process. 2002, 22, 239.
  • 9Bai, X.-Y.; Zhang, Z.-T.; Bai, M.-D.; Zhu, Q.-Y. Physics 2000, 7, 406 (in Chinese).(白希尧, 张芝涛, 白敏 , 朱巧英, 物理, 2000, 7, 406.)
  • 10Jiang, J.-M.; Hou, J.; Zheng, G.-Y.; Hou, H.-Q. Chin. Environ. Sci. 2002, 21, 531 (in Chinese).(蒋洁敏, 侯健, 郑光云, 侯惠奇, 中国环境科学, 2002, 21, 531.)

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