摘要
Poly(4-diazosulfonate styrene-co-4-vinylpyridine) (P(DSS-co-VP)),containing both H-acceptor moieties of pyridine and photosensitive diazosulfonate groups,was synthesized and has been used for self-assembly as a new component.The layer-by-layer deposition between P(DSS-co-VP)and m-methyl phenol formaldehyde resin (MPR) on a substrate via H-bonding interaction was investigated.After UV irradiation the stability of the multiplayer ultra thin film toward polar solvents is improved dramatically.The improvement of the solvent stability of the film should be attributed to the bond conversion between the layers of the film from H-bond to covalent bond under UV irradiation.
Poly(4-diazosulfonate styrene-co-4-vinylpyridine) (P(DSS-co-VP)), containing both H-acceptor moieties of pyridine and photosensitive diazosulfonate groups,was synthesized and has been used for self-assembly as a new component. The layer-by-layer deposition between P(DSS-co-VP) and m-methyl phenol formaldehyde resin (MPR) on a substrate via H-bonding interaction was investigated. After UV irradiation the stability of the multiplayer ultra thin film toward polar solvents is improved dramatically. The improvement of the solvent stability of the film should be attributed to the bond conversion between the layers of the film from H-bond to covalent bond under UV irradiation.
出处
《高分子学报》
SCIE
CAS
CSCD
北大核心
2004年第5期776-779,共4页
Acta Polymerica Sinica
基金
国家自然科学基金资助课题 (基金号 2 0 2 740 0 2
5 0 173 0 0 2 )
