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磁控溅射法制备的PZT非晶薄膜光学性质研究 被引量:1

OPTICAL PROPERTIES OF PZT AMORPHOUS THIN FILMS PREPARED BY RF MAGNETRON SPUTTERING
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摘要 采用磁控溅射方法在石英玻璃上制备了PbZrxTi1-xO3 (PZT) (x =0 .5 2 )非晶薄膜 ,并测量了 2 0 0~ 110 0nm的紫外 可见 近红外透射光谱 .基于薄膜的结构和多层结构的透射关系 ,发展了仅有 6个拟合参数的光学常数计算模型 .利用该模型 ,可以同时获得薄膜在宽波段范围内的光学常数和厚度 ,得到折射率的最大值为 2 .6 8,消光系数的最大值为 0 .5 6 2 ,拟合薄膜厚度为 318.1nm .根据Tauc′s法则 ,得到PZT非晶薄膜的直接禁带宽度为 3.75eV .最后 。 The optical properties of PbZrxTi1-xO3 (x = 0.52) amorphous thin films on vitreous silica substrates by RF magnetron sputtering were investigated by UV similar to VIS similar to NIR transmittance measurement in the wavelength range of 200 similar to 1100nm. Meanwhile, based on the structure of thin films on the transparent substrate and the transmittance relations of multilayer structure, the fitting method with six fitting parameters was developed to calculate the optical constants. The optical constants of thin films in the wide wavelength range and the film thickness were obtained simultaneously. The maximum values of the refractive index and extinction coefficient are 2.68 and 0.562, respectively. The film thickness by the fitting is 318.1 nm. According to Tauc's law, the direct band gap of the PZT amorphous thin film is found to be 3.75eV. Finally, the dispersion relation of the refractive index of the thin films is successfully interpreted by considering a single-oscillator model.
出处 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2004年第3期181-184,188,共5页 Journal of Infrared and Millimeter Waves
基金 国家重点基础研究 (G0 0 1CB3 0 95 )
关键词 磁控溅射法 PZT非晶薄膜 禁带宽度 折射率 透射率 消光系数 PbZrx Ti1-xO3 amorphous thin films the refractive index the band gap
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