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Schottky forward current transport mechanisms in AlGaN/GaN HEMTs over a wide temperature range
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作者 武玫 郑大勇 +5 位作者 王媛 陈伟伟 张凯 马晓华 张进成 郝跃 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第9期409-413,共5页
The behavior of Schottky contacts in AlGaN/GaN high electron mobility transistors (HEMTs) is investigated by temperature-dependent current-voltage (T-I-V) measurements from 300 K to 473 K. The ideality factor and ... The behavior of Schottky contacts in AlGaN/GaN high electron mobility transistors (HEMTs) is investigated by temperature-dependent current-voltage (T-I-V) measurements from 300 K to 473 K. The ideality factor and barrier height determined based on the thermionic emission (TE) theory are found to be strong functions of temperature, while present a great deviation from the theoretical value, which can be expounded by the barrier height inhomogeneities. In order to determine the forward current transport mechanisms, the experimental data are analyzed using numerical fitting method, considering the temperature-dependent series resistance. It is observed that the current flow at room temperature can be attributed to the tunneling mechanism, while thermionic emission current gains a growing proportion with an increase in temperature. Finally, the effective barrier height is derived based on the extracted thermionic emission component, and an evaluation of the density of dislocations is made from the I-V characteristics, giving a value of 1.49 × 10^7 cm^-2. 展开更多
关键词 AlGaN/GaN HEMTs Schottky contacts forward current transport mechanism temperature dependence
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First-principles calculations innovation in wide bandgap semiconductors:Multiphysics field coupling and functional device design
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作者 Jie Wang Yizhang Wu +2 位作者 Hefang Cao Yong Wang Aimei Zhang 《Chain》 2025年第2期104-130,共27页
Wide bandgap semiconductors have become the core material system for high-power electronic devices,deep-ultraviolet optoelectronic devices,and quantum information technology,featuring high-temperature stability and op... Wide bandgap semiconductors have become the core material system for high-power electronic devices,deep-ultraviolet optoelectronic devices,and quantum information technology,featuring high-temperature stability and optoelectronic properties.First-principles calculations play an irreplaceable role in revealing the intrinsic physical properties of materials,guiding the optimization of energy-band engineering,and predicting the performance of devices through accurate modeling at the quantum mechanical level.This paper systematically reviews the key advances of first-principles calculations in wide bandgap semiconductor research in recent years:from the theoretical breakthroughs in electronic structure calculation and bandgap correction to the multiscale modeling of photoexcitation dynamics and thermal transport behavior;from the innovative design of defect formation mechanisms and doping strategies to the prediction of the performance of low-dimensional materials and heterojunction devices.The review shows that by integrating multi-body perturbation theory,machine learning algorithms,and dynamic simulation technology,first-principles calculations promote the paradigm shift from empirical exploration to theory-driven research on wide bandgap semiconductors,and the material-performance-device-function correlation model established by the study will lay the theoretical foundation for the breakthrough development of new-generation semiconductor technology. 展开更多
关键词 wide bandgap semiconductors first-principles calculations machine learning defect engineering multiscale modeling
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低空穴衬底电流的新型体硅横向绝缘栅双极晶体管
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作者 段宝兴 李玉滢 +2 位作者 唐春萍 任宇壕 杨银堂 《物理学报》 北大核心 2026年第5期331-339,共9页
本文提出一种新型延伸多晶硅栅体硅型横向绝缘栅双极晶体管(extended polysilicon gate bulk silicon LIGBT,EGBS-LIGBT),该器件结构为P型衬底上依次外延N型、P型硅作为N漂移区和P漂移区,相当于将常规SOI(silicon-on-insulator)-LIGBT... 本文提出一种新型延伸多晶硅栅体硅型横向绝缘栅双极晶体管(extended polysilicon gate bulk silicon LIGBT,EGBS-LIGBT),该器件结构为P型衬底上依次外延N型、P型硅作为N漂移区和P漂移区,相当于将常规SOI(silicon-on-insulator)-LIGBT的埋氧层替换成N型硅,其优势在于极大降低成本且能降低空穴衬底电流.在阳极正偏时,P漂移区上方的肖特基型延伸多晶硅栅(Schottky-extended polysilicon gate,S-EG)在P漂移区的内侧表面形成电子反型层,以获得低的正向导通压降(V_(on)).此外,阳极采用肖特基接触降低空穴注入效率,而P漂移区快速的动态电场调制能力还可迅速提取存储在漂移区中的过剩载流子,且其多子为空穴还能促进关断时过剩电子的快速复合,关断能量损耗(E_(off))得以降低.仿真结果表明:EGBS-LIGBT在显著降低空穴衬底电流的同时,改善了E_(off)与V_(on)间的折中关系.该器件的V_(on)为1.59 V、空穴衬底电流为1.9 mA/cm^(2)、E_(off)为0.51 mJ/cm^(2)、击穿电压(BV)达701 V.相较常规LIGBT,该结构在保持V_(on)基本不变的前提下,将空穴衬底电流降至1/105,E_(off)降低69.8%,BV提升19.6%. 展开更多
关键词 横向绝缘栅双极晶体管 空穴衬底电流 关断损耗 肖特基接触
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宽速域高压捕获翼气动构型及其跨声速气动特性
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作者 崔凯 王泽森 +3 位作者 肖尧 田中伟 李广利 常思源 《航空学报》 北大核心 2026年第1期1-15,共15页
具备高超声速巡航能力的宽速域飞行器是近年来国内外的研究热点,然而,更宽的飞行速域给气动布局设计带来了巨大的挑战。为有效突破实用化升阻比与容积率之间的矛盾,基于高压捕获翼气动布局概念提出了一种具有大容积率特征的新型气动构型... 具备高超声速巡航能力的宽速域飞行器是近年来国内外的研究热点,然而,更宽的飞行速域给气动布局设计带来了巨大的挑战。为有效突破实用化升阻比与容积率之间的矛盾,基于高压捕获翼气动布局概念提出了一种具有大容积率特征的新型气动构型,仿真结果表明该构型在马赫数6.0条件下最大升阻比可达5.89,相比于不带捕获翼的参考构型而言升阻比增量超过18%。在此基础上,重点针对马赫数0.8和1.2两个典型跨声速状态进行了数值仿真与分析。结果表明,相较参考构型,新型高压捕获翼气动构型在两种状态下的升力和阻力系数均有不同程度的增加。尽管升阻比有一定损失,但在整个宽速域范围内气动焦点的偏移量明显减小。在跨声速速域内焦点相对偏移量减小11.1%,在跨声速至高超声速速域内焦点相对偏移量减小49.9%。进一步分析表明,气动焦点偏移量的缩减主要是新增翼面与机身间的耦合作用所致。 展开更多
关键词 宽速域 高压捕获翼 气动构型 计算流体力学 跨声速
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集成异质结二极管的4H-SiC半超结MOSFET
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作者 张闯 张腾 +2 位作者 黄润华 李士颜 柏松 《电子元件与材料》 北大核心 2026年第2期150-156,共7页
为改善碳化硅(SiC)超结MOSFET体二极管的反向恢复特性并降低开关损耗,提出一种集成异质结二极管的超结MOSFET(SJH-MOSFET)新结构。该结构在栅槽底部引入与源极短接的P+多晶硅,与4H-SiC漂移区构成异质结续流二极管;同时增设P+屏蔽层并采... 为改善碳化硅(SiC)超结MOSFET体二极管的反向恢复特性并降低开关损耗,提出一种集成异质结二极管的超结MOSFET(SJH-MOSFET)新结构。该结构在栅槽底部引入与源极短接的P+多晶硅,与4H-SiC漂移区构成异质结续流二极管;同时增设P+屏蔽层并采用半超结设计以优化电场。基于TCAD的仿真对比分析表明,相较于传统双沟槽结构,新器件的击穿电压提升18.4%至1710 V,比导通电阻降低12.1%至1.45 mΩ·cm^(2)。异质结二极管有效抑制了少子注入,使反向恢复电荷降低60.9%;减小的栅-漏耦合面积则使米勒平台电荷降低79.2%,总开关损耗减少40.4%。该研究为同时优化动态特性与可靠性的高性能SiC功率器件设计提供了有效途径。 展开更多
关键词 4H-SiC MOSFET 超结 异质结 反向恢复特性
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Wide-range-adjusted threshold voltages for E-mode AlGaN/GaN HEMT with a p-SnO cap gate 被引量:3
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作者 Dazheng Chen Peng Yuan +13 位作者 Shenglei Zhao Shuang Liu Qian Xin Xiufeng Song Shiqi Yan Yachao Zhang He Xi Weidong Zhu Weihang Zhang Jiaqi Zhang Hong Zhou Chunfu Zhang Jincheng Zhang Yue Hao 《Science China Materials》 SCIE EI CAS CSCD 2022年第3期795-802,共8页
p-GaN cap layer has been recognized as a commercial technology to manufacture enhanced-mode(E-mode)AlGaN/GaN high electron mobility transistor(HEMT);however,the difficult activation of Mg doping and etching damage of ... p-GaN cap layer has been recognized as a commercial technology to manufacture enhanced-mode(E-mode)AlGaN/GaN high electron mobility transistor(HEMT);however,the difficult activation of Mg doping and etching damage of p-GaN limit the further improvement of device performance.Thus,the more cost-effective cap layer has attracted wide attention in GaN-based HEMT.In this paper,p-type tin monoxide(p-SnO)was firstly investigated as a gate cap to realize E-mode AlGaN/GaN HEMT by both Silvaco simulation and experiment.Simulation results show that by simply adjusting the thickness(50 to 200 nm)or the doping concentration(3×10^(17)to 3×10^(18)cm^(-3))of p-SnO,the threshold voltage(V_(th))of HEMT can be continuously adjusted in the range from zero to 10 V.Simultaneously,the device demonstrated a drain current density above 120 mA mm^(-1),a gate breakdown voltage(V_(BG))of 7.5 V and a device breakdown voltage(V_(B))of 2470 V.What is more,the etching-free AlGaN/GaN HEMT with sputtered p-SnO gate cap were fabricated,and achieved a positive V_(th) of 1 V,V_(BG) of 4.2 V and V_(B) of 420 V,which confirms the application potential of the p-SnO film as a gate cap layer for E-mode GaN-based HEMT.This work is instructive to the design and manufacture of p-oxide gate cap E-mode AlGaN/GaN HEMT with low cost. 展开更多
关键词 p-SnO gate cap E-mode AlGaN/GaN HEMT positive threshold voltage wide-range adjustment silvaco ATLAS sputtered p-SnO
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双金属离子掺杂调控准二维钙钛矿薄膜光学性质
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作者 季思航 胡言松 +1 位作者 张婉怡 袁曦 《半导体光电》 北大核心 2026年第1期116-123,共8页
准二维铅卤钙钛矿薄膜(A_(2)B_(n-1)Pb_(n)Br_(3n+1))具有发光线宽窄、激子束缚能高和载流子扩散寿命长等优势,但该材料在发光效率和光稳定性方面仍存在不足,在多种实际应用场景中仍然面临挑战。为此,文章提出一种双金属协同掺杂策略,... 准二维铅卤钙钛矿薄膜(A_(2)B_(n-1)Pb_(n)Br_(3n+1))具有发光线宽窄、激子束缚能高和载流子扩散寿命长等优势,但该材料在发光效率和光稳定性方面仍存在不足,在多种实际应用场景中仍然面临挑战。为此,文章提出一种双金属协同掺杂策略,以增强薄膜的光量子产率。通过在准二维锌钛矿(BA_(2)MA_(n-1)Pb_(n)Br_(3n+1))薄膜中共掺杂Cs^(+)和Cd^(2+)离子,显著优化了薄膜的光学性能和相稳定性。X射线衍射证实了准二维钙钛矿的结构演变,层数从n=1增加至n>3。扫描电子显微镜展示出掺杂薄膜的平坦形貌、表面针孔被有效修饰。X射线光电子能谱特征峰证明,Cs^(+)和Cd^(2+)离子被有效掺杂到晶格。光谱分析表明,一价Cs^(+)离子掺杂会迫使准二维钙钛矿层数增加,导致使激子发光峰红移,而二价Cd^(2+)离子掺杂会引起晶格收缩,导致激子发光蓝移。将这两种金属离子引入晶格后,有效钝化了薄膜的能级缺陷态,延长了带边的复合寿命,进而提高了薄膜量子产率至85%。此外,Cs^(+)和Cd^(2+)离子的协同作用改善了薄膜的相稳定性,在12 h后仍能维持高质量发光。 展开更多
关键词 准二维钙钛矿薄膜 金属离子掺杂 缺陷态 光致发光 相稳定性
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A high gain wide dynamic range transimpedance amplifier for optical receivers 被引量:4
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作者 刘帘曦 邹姣 +4 位作者 恩云飞 刘术彬 牛越 朱樟明 杨银堂 《Journal of Semiconductors》 EI CAS CSCD 2014年第1期78-83,共6页
As the front-end preamplifiers in optical receivers, transimpedance amplifiers (TIAs) are commonly required to have a high gain and low input noise to amplify the weak and susceptible input signal. At the same time,... As the front-end preamplifiers in optical receivers, transimpedance amplifiers (TIAs) are commonly required to have a high gain and low input noise to amplify the weak and susceptible input signal. At the same time, the TIAs should possess a wide dynamic range (DR) to prevent the circuit from becoming saturated by high input currents. Based on the above, this paper presents a CMOS transimpedance amplifier with high gain and a wide DR for 2.5 Gbit/s communications. The TIA proposed consists of a three-stage cascade pull push inverter, an automatic gain control circuit, and a shunt transistor controlled by the resistive divider. The inductive-series peaking technique is used to further extend the bandwidth. The TIA proposed displays a maximum transimpedance gain of 88.3 dBΩ with the -3 dB bandwidth of 1.8 GHz, exhibits an input current dynamic range from 100 nA to 10 mA. The output voltage noise is less than 48.23 nV/√Hz within the -3 dB bandwidth. The circuit is fabricated using an SMIC 0.18 μm 1P6M RFCMOS process and dissipates a dc power of 9.4 mW with 1.8 V supply voltage. 展开更多
关键词 transimpedance amplifier high gain inductive-series peaking wide dynamic range
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氢覆盖度对氢终端金刚石迁移率的影响:第一性原理研究
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作者 葛良兵 陶然 +1 位作者 郁鑫鑫 李忠辉 《固体电子学研究与进展》 2026年第1期1-5,共5页
氢终端金刚石因其表面转移掺杂效应和潜在的高载流子迁移率,在高功率与高频电子器件中具有重要应用前景,然而实验中金刚石迁移率对其表面氢状态高度敏感,微观机制尚不清晰。基于此,采用第一性原理计算,系统研究了氢覆盖度对氢终端金刚... 氢终端金刚石因其表面转移掺杂效应和潜在的高载流子迁移率,在高功率与高频电子器件中具有重要应用前景,然而实验中金刚石迁移率对其表面氢状态高度敏感,微观机制尚不清晰。基于此,采用第一性原理计算,系统研究了氢覆盖度对氢终端金刚石载流子迁移率的影响。通过构建不同氢覆盖度的表面模型,分析能带特性、形变势以及载流子有效质量的变化。结果表明0.75 ML覆盖度的氢终端金刚石具有最高迁移率(7786.13 cm^(2)·V^(-1)s^(-1)),过高过低都会削弱输运性能,为实验调控表面氢化条件和器件性能提供了理论指导。 展开更多
关键词 氢终端金刚石 第一性原理计算 载流子迁移率 氢覆盖度
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n型SiC外延材料少子寿命的关键影响因素与提升方法
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作者 王翼 孔龙 +3 位作者 熊瑞 赵志飞 曹越 李赟 《固体电子学研究与进展》 2026年第1期11-16,共6页
系统研究了外延生长和氢气气氛退火工艺条件对4H-SiC同质外延材料少子寿命的影响,并分析了退火后少子寿命变化与前期外延速率之间的关联性。研究结果表明,SiC外延材料少子寿命与外延层厚度具有明显的正相关性,但随生长速率和进气端C/Si... 系统研究了外延生长和氢气气氛退火工艺条件对4H-SiC同质外延材料少子寿命的影响,并分析了退火后少子寿命变化与前期外延速率之间的关联性。研究结果表明,SiC外延材料少子寿命与外延层厚度具有明显的正相关性,但随生长速率和进气端C/Si比的提高并非单调递增关系。在本文采用的工艺条件中,进气端C/Si为0.84、生长速率为72.1μm/h时外延材料少子寿命最高,达到2280 ns。采用不同温度和乙烯流量的氢气退火工艺均能在不同程度上提高已有SiC外延材料的少子寿命。在1600℃退火后少子寿命提升幅度最大,但继续提升退火温度对少子寿命的提升效果减弱。退火效果和乙烯流量之间存在正相关性,但当乙烯流量达到50 sccm(标准状态下1 sccm=1 mL/min)时,材料表面质量退化,缺陷扩展区域粗糙度高达8.35 nm。前期外延生长速率不同,会导致退火后少子寿命提升幅度存在差异,采用高生长速率生长的外延材料,退火后少子寿命提升效果更加显著。 展开更多
关键词 少子寿命 4H-SIC C/Si比 生长速率 退火
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A Ku-band wide-tuning-range high-output-power VCO in InGaP/GaAs HBT technology 被引量:2
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作者 张金灿 张玉明 +4 位作者 吕红亮 张义门 刘博 张雷鸣 向菲 《Journal of Semiconductors》 EI CAS CSCD 2015年第6期156-160,共5页
A fully integrated Ku-band voltage controlled oscillator (VCO) is presented in an InGaP/GaAs hetero- junction bipolar transistor (HBT) technology. To achieve the wide tuning range (TR), the VCO employs a Colpitt... A fully integrated Ku-band voltage controlled oscillator (VCO) is presented in an InGaP/GaAs hetero- junction bipolar transistor (HBT) technology. To achieve the wide tuning range (TR), the VCO employs a Colpitts configuration, and the VCO simultaneously achieves high output power. The implemented VCO demonstrates an oscillation frequency range from 12.82 to 14.97 GHz, a frequency TR of 15.47%, an output power from 0.31 to 6.46 dBm, and a phase noise of -94.9 dBc/Hz at 1 MHz offset from 13.9 GHz center frequency. The VCO con- sumes 52.75 mW from 5 V supply and occupies an area of 0.81 × 0.78 mm2. Finally, the figures-of-merit for VCOs is discussed. 展开更多
关键词 voltage controlled oscillator InGaP/GaAs HBT Ku band wide tuning range high output power
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广域电磁法技术进展与多领域应用综述
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作者 何继善 张大伟 +4 位作者 蒋奇云 张钱江 尹文斌 李杰 童小畅 《中国有色金属学报》 北大核心 2026年第2期409-429,共21页
广域电磁法作为我国地球物理勘探领域具有原创性的技术突破,基于伪随机信号编码与严格的数学解理论,重构了电磁勘探方法体系,有效克服了传统电磁法在探测深度、分辨率及环境适应性等方面的技术瓶颈。本文系统总结了该技术体系的创新性进... 广域电磁法作为我国地球物理勘探领域具有原创性的技术突破,基于伪随机信号编码与严格的数学解理论,重构了电磁勘探方法体系,有效克服了传统电磁法在探测深度、分辨率及环境适应性等方面的技术瓶颈。本文系统总结了该技术体系的创新性进展:在理论方法层面,提出强干扰背景下的广域电磁数据处理新方法,构建了深部探测与浅层勘查相衔接、航空观测与地面勘探相协同的立体探测技术框架;在装备研制领域,突破了大功率发射系统优化、抗干扰信号采集及多平台集成适配等关键技术,成功实现从陆地固定式装备到深海拖曳系统、航空探测平台的全链条国产化技术升级;在工程应用方面,重点展示了该方法在固体矿产勘探、油气资源评价、地热田勘查、煤田水害预警、页岩气压裂监测及地质灾害识别等领域的创新应用成果,验证了其多场景应用的适应性与可靠性;还前瞻性探讨了人工智能大模型解释算法开发及地质灾害动态监测网络构建等发展方向,为服务国家“深地探测”“海洋强国”战略及地质灾害防控体系建设提供理论依据与技术支撑。 展开更多
关键词 广域电磁法 协同探测 伪随机信号 高精度
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常化工艺对W470无取向硅钢组织和织构的影响
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作者 郑亚旭 王坤 +4 位作者 高晗 张觉灵 李永亮 吕皓杰 牛崇宇 《河北科技大学学报》 北大核心 2026年第1期1-11,共11页
为了解决无结晶器电磁搅拌条件下生产的W470无取向硅钢热轧板存在大量变形组织和不利织构的问题,利用电子背散射衍射仪(electron backscattered diffraction,EBSD)研究了常化工艺参数对W470再结晶行为、晶粒尺寸和织构的影响规律。结果... 为了解决无结晶器电磁搅拌条件下生产的W470无取向硅钢热轧板存在大量变形组织和不利织构的问题,利用电子背散射衍射仪(electron backscattered diffraction,EBSD)研究了常化工艺参数对W470再结晶行为、晶粒尺寸和织构的影响规律。结果表明:W470热轧板中心层存在大量的非再结晶组织,对于不同常化温度,从840℃升高至960℃,中心层再结晶率逐渐升高,930℃常化后发生完全再结晶;对于不同常化保温时间,在900℃条件下随着保温时间从1 min延长至9 min,中心层逐渐发生完全再结晶(保温7 min后已发生完全再结晶);常化板表层由{110}〈110〉和{114}〈110〉织构组成,中心层为γ纤维织构、铜型织构和旋转立方织构;随着常化温度提高和保温时间延长,再结晶率提高,对磁性能不利的γ织构强度减弱。研究结果揭示了在缺乏连铸结晶器电磁搅拌的条件下常化温度与保温时间对W470无取向硅钢组织与织构的协同作用规律,为获得良好的微观组织与织构提供了一定参考。 展开更多
关键词 金属学 无取向硅钢 常化工艺 再结晶 组织 织构
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Tea polyphenol polymer film enables broadband optical modulation for hybrid mode-locked ultrafast fiber lasers
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作者 Wei Chen Kang Li +4 位作者 Cheng Gao Qingping Hu Zhengfan Li Yi Xiong Yunzhou Sun 《Chinese Physics B》 2026年第2期442-450,共9页
Materials exhibiting broadband nonlinear optical responses are critically important for ultrafast photonics applications,particularly as saturable absorbers(SAs)that facilitate broadband optical pulse generation.In th... Materials exhibiting broadband nonlinear optical responses are critically important for ultrafast photonics applications,particularly as saturable absorbers(SAs)that facilitate broadband optical pulse generation.In this study,tea polyphenolpolyvinyl alcohol(TP-PVA)composite films are synthesized via a polymer embedding method and employed as SAs to initiate ultrafast pulse operation in fiber lasers.The TP-PVA SA film exhibits excellent broadband saturable absorption performance at wavelengths of 1.0μm,1.5μm,and 2.0μm,with modulation depths of 54.21%,41.41%,and 51.16%,respectively.Stable passively mode-locked pulses with pulse widths of 588 fs,419 fs,and 743 fs are generated in Yb-,Er-,and Tm-doped fiber lasers,respectively.This work confirms the effective performance of TP-PVA as a broadband SA,and establishes a foundation for the integration of novel and sustainable materials within ultrafast photonic systems.The approach paves the way for developing compact broadband ultrafast laser systems operating in the near-infrared spectral region. 展开更多
关键词 ultrafast fiber lasers saturable absorbers broadband modulators natural dyes tea polyphenol
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冷轧热镀锌板表面线状缺陷成因分析
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作者 李硕 李永亮 +3 位作者 吕皓杰 窦为学 王美玉 牛崇宇 《河北冶金》 2026年第2期91-99,共9页
针对某热镀锌产线出现的表面线状缺陷,采用光学显微镜(OM)、扫描电镜(SEM)及能谱仪(EDS)系统地研究了缺陷在热镀锌板、脱锌基板和冷硬板中的微观形貌及化学成分,明确了其产生原因。结果表明:线状缺陷的形成原因可归结为炼钢工序遗传的... 针对某热镀锌产线出现的表面线状缺陷,采用光学显微镜(OM)、扫描电镜(SEM)及能谱仪(EDS)系统地研究了缺陷在热镀锌板、脱锌基板和冷硬板中的微观形貌及化学成分,明确了其产生原因。结果表明:线状缺陷的形成原因可归结为炼钢工序遗传的氧化物夹杂。在轧制过程中,随着金属基体发生塑性变形,夹杂物逐渐靠近带钢表面。在带钢拉应力和轧制压应力的共同作用下,夹杂物周围的基体发生破裂,形成微裂纹。这些微裂纹扩展并延伸至带钢表面,导致部分夹杂物裸露于表面。裸露的夹杂物和破裂处的粗糙表面,一方面影响锌液在凝固前的正常回流,造成锌液滞留与局部增厚,另一方面为锌液凝固提供额外的形核点,造成局部细小锌结晶的形成。这种微观结构的不均匀性会改变产品表面对光线的反射作用,进而在宏观表面形成可见的线状缺陷。通过降低转炉终点氧含量、延长精炼软吹时间等改进措施,提高了钢水纯净度,并将B类、D类粗系夹杂物评级控制在1.5级以下,薄规格冷轧产品的原料内部夹杂物控制在1.0级以下,冷轧产品夹杂缺陷发生率由2.05%降至0.6%。 展开更多
关键词 热镀锌板 线状缺陷 氧化物夹杂 锌结晶 光线反射作用 纯净度
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热轧冷却方式与冷轧压下率对低碳退火板性能的影响
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作者 吕皓杰 李永亮 +3 位作者 牛崇宇 田源 李硕 王美玉 《河北冶金》 2026年第2期28-36,共9页
针对国产化设备生产的低碳冷轧退火板,系统探究了热轧冷却工艺与冷轧压下率对材料织构及力学性能的影响机制。通过对比热轧前段冷却工艺与后段冷却工艺发现:后段冷却工艺因奥氏体高温停留时间延长,促进了晶粒粗化,使退火后屈服/抗拉强... 针对国产化设备生产的低碳冷轧退火板,系统探究了热轧冷却工艺与冷轧压下率对材料织构及力学性能的影响机制。通过对比热轧前段冷却工艺与后段冷却工艺发现:后段冷却工艺因奥氏体高温停留时间延长,促进了晶粒粗化,使退火后屈服/抗拉强度降低约10 MPa,同时R值提升0.17。微观组织分析表明,后段冷却工艺可显著改善钢板的横向性能均匀性,抑制边部与中心区域强度差异。此外,冷轧压下率提升至62.5%以上时,边部力学性能异常点消失,混晶现象减少,{111}织构比例增加,并且在厚度方向上的分布更均匀。EBSD分析表明,高压下率(66.7%)可促进γ纤维织构({111}//ND)的演化,再结晶过程中{111}<112>取向晶粒的竞争性生长主导了深冲性能的优化。研究表明,热轧后段冷却结合冷轧大压下率工艺(≥62.5%),通过储能均匀化与晶粒细化(Hall-Petch效应),有效协调强度、塑性及各向异性,使屈强比降至0.7以下,横向性能稳定性显著提升。该工艺在国产设备上实现了高成形性冷轧钢的生产可行性,为低碳钢深冲性能优化提供了理论与实践依据。 展开更多
关键词 冷成形钢 前段冷却工艺 后段冷却工艺 冷轧压下率 织构 抗拉强度 屈强比
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预缩机层级冷却水循环系统的设计与应用
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作者 李梦 袁建赫 +4 位作者 任长友 刘文辉 赵金帅 孟小娣 吕治家 《染整技术》 2026年第1期30-33,65,共5页
根据纺织行业“十四五”绿色发展指导意见,强化印染行业清洁生产及促进资源循环利用是大势所趋。设计一种应用于预缩机的层级冷却水循环系统,能够对使用后的冷却水进行快速降温,保证冷却水循环系统的工作效率和对待冷却物的降温效率,并... 根据纺织行业“十四五”绿色发展指导意见,强化印染行业清洁生产及促进资源循环利用是大势所趋。设计一种应用于预缩机的层级冷却水循环系统,能够对使用后的冷却水进行快速降温,保证冷却水循环系统的工作效率和对待冷却物的降温效率,并且能够对降温后的冷却水进行循环利用,实现水资源和热能的回收,从而提高冷却水的利用率。该冷却水循环系统工作过程清洁、生产能耗降低并且资源可循环利用,可以为国家顺利实现“双碳”目标做贡献。 展开更多
关键词 冷却水循环系统 冷却效率 资源循环利用 智能控制系统
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Moisture-Resistant Scalable Ambient-Air Crystallization of Perovskite Films via Self-Buffered Molecular Migration Strategy
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作者 Mei Yang Weidong Zhu +9 位作者 Laijun Liang Wenming Chai Xiaomeng Wu Zeyang Ren Long Zhou Dazheng Chen He Xi Chunfu Zhang Jincheng Zhang Yue Hao 《Nano-Micro Letters》 2026年第2期421-438,共18页
Ambient-air,moisture-assisted annealing is widely used in fabricating perovskite solar cells(PSCs).However,the inherent sensitivity of perovskite intermediate-phase to moisture—due to fast and spontaneous intermolecu... Ambient-air,moisture-assisted annealing is widely used in fabricating perovskite solar cells(PSCs).However,the inherent sensitivity of perovskite intermediate-phase to moisture—due to fast and spontaneous intermolecular exchange reaction—requires strict control of ambient humidity and immediate thermal annealing treatment,raising manufacturing costs and causing fast nucleation of perovskite films.We report herein a self-buffered molecular migration strategy to slow down the intermolecular exchange reaction by introducing a n-butylammonium bromide shielding layer,which limits moisture diffusion into intermediate-phase film.This further endows the notably wide nucleation time and humidity windows for perovskite crystallization in ambient air.Consequently,the optimized 1.68 e V-bandgap n-i-p structured PSC reaches a record-high reverse-scan(RS)PCE of 22.09%.Furthermore,the versatility and applicability of as-proposed self-buffered molecular migration strategy are certified by employing various shielding materials and 1.53 eV-/1.77 eV-bandgap perovskite materials.The n-i-p structured PSCs based on 1.53 eV-and 1.77 eV-bandgap perovskite films achieve outstanding RS PCEs of 25.23%and 19.09%,respectively,both of which are beyond of the state-of-the-art ambient-air processed PSCs. 展开更多
关键词 Perovskite solar cell Ambient-air annealing Intermediate phase Intermolecular exchange High-humidity crystallization
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Solar-blind UV light-modulatedβ-Ga_(2)O_(3)full-wave bridge rectifier
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作者 Haifeng Chen Yuduo Zhang +9 位作者 Xiexin Sun Jingguo Zong Qin Lu Yifan Jia Zhenfu Feng Zhan Wang Lijun Li Xiangtai Liu Shaoqing Wang Yue Hao 《Journal of Semiconductors》 2026年第1期24-28,共5页
A monolithic integrated full-wave bridge rectifier consisted of horizontal Schottky-barrier diodes(SBD)is prepared based on 100 nm ultra-thin β-Ga_(2)O_(3)and demonstrated the solar-blind UV(SUV)light-modulated chara... A monolithic integrated full-wave bridge rectifier consisted of horizontal Schottky-barrier diodes(SBD)is prepared based on 100 nm ultra-thin β-Ga_(2)O_(3)and demonstrated the solar-blind UV(SUV)light-modulated characteristics.Under SUV light illumination,the rectifier has the excellent full-wave rectification characteristics for the AC input signals of 5,12,and 24 V with different frequencies.Further,experimental results confirmed the feasibility of continuously tuning the rectified output through SUV light-encoding.This work provides valuable insights for the development of optically programmable Ga_(2)O_(3)ACDC converters. 展开更多
关键词 β-Ga_(2)O_(3) Schottky-barrier diode full-wave bridge rectifier solar-blind UV
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Dopant-Free Ultra-Thin Spiro-OMeTAD Enables Near 30%-Efficient n-i-p Perovskite/Silicon Tandem Solar Cells
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作者 Xiangying Xue Weichuang Yang +5 位作者 Zhiqin Ying Fangfang Cao Yuheng Zeng Zhenhai Yang Xi Yang Jichun Ye 《Nano-Micro Letters》 2026年第4期353-370,共18页
A major challenge for n-i-p structured perovskite/silicon tandem solar cells(TSCs)is the use of 2,2′,7,7′-tetrakis[N,N-di(4-methoxyphenyl)amino]-9,9′-spirobifluorene(spiro-OMe TAD),a commonly used hole transport la... A major challenge for n-i-p structured perovskite/silicon tandem solar cells(TSCs)is the use of 2,2′,7,7′-tetrakis[N,N-di(4-methoxyphenyl)amino]-9,9′-spirobifluorene(spiro-OMe TAD),a commonly used hole transport layer,which induces significant optical losses and consequently reduces device current.Herein,we propose an ultra-thin(10 nm)vacuum thermal evaporation(VTE)-deposited spiro-OMe TAD,coupled with a 2D/3D perovskite heterojunction,to simultaneously enhance the optical and electrical properties of n-i-p perovskite/silicon TSCs.Our results demonstrate that the 10-nm-thick spiro-OMe TAD layer significantly improves optical performance,achieving a 92.2% reduction in parasitic absorption and an 18.4%decrease in reflection losses.Additionally,the incorporation of the 2D/3D perovskite heterojunction facilitates improved molecular arrangement and enhanced surface uniformity of the ultrathin spiro-OMe TAD,leading to higher tolerance to interface defects and more efficient hole extraction.Consequently,n-i-p perovskite/silicon TSCs featuring ultrathin spiro-OMe TAD exhibit remarkable efficiencies of 29.73%(0.135 cm^(2))and 28.77%(28.25% certified efficiency,1.012 cm^(2)),along with improved stability. 展开更多
关键词 Perovskite/silicon tandem solar cells Hole transport layers Optical loss reduction Optical design
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