Diamond-like carbon(DLC)films were prepared on Si(100) substrates by ion implantation from an electron cyclotron resonance microwave plasma source.During the implantation,650W microwave power was used to produce disch...Diamond-like carbon(DLC)films were prepared on Si(100) substrates by ion implantation from an electron cyclotron resonance microwave plasma source.During the implantation,650W microwave power was used to produce discharge plasma with methane as working gas,and-20KV voltage pulses were applied to the substrate holder to accelerate ions in the plasma.Confocal Raman spectra confirmed the DLC characteristics of the films.Fourier-transform infrared characterization indicates that the DLC films were composed of sp^3 and sp^2 carbonbonded hydrogen.The hardness of the films was evaluated with a Nano Indenter-XP System.The result shows that the highest hardness valus was 14.6 GPa.The surface rms roughness of the films was as low as 0.104nm measured with an atomic force microscope.The friction coeffcient of the films was checked using a ball-on-disk microtribometer.The average friction coefficient is approximately 0.122.展开更多
Progress of the theoretical studies on the ion sheath dynamics in plasma source ion implantation (PSII) is reviewed in this paper. Several models for simulating the ion sheath dynamics in PSII are provided. The main p...Progress of the theoretical studies on the ion sheath dynamics in plasma source ion implantation (PSII) is reviewed in this paper. Several models for simulating the ion sheath dynamics in PSII are provided. The main problem of nonuniform ion implantation on the target in PSII is dis-cussed by analyzing some calculated results. In addition, based on the relative researches in our laboratory, some cal-culated results of the ion sheath dynamics in PSII for inner surface modification of a cylindrical bore are presented. Fi-nally, new ideas and tendency for future researches on ion sheath dynamics in PSII are proposed.展开更多
文摘Diamond-like carbon(DLC)films were prepared on Si(100) substrates by ion implantation from an electron cyclotron resonance microwave plasma source.During the implantation,650W microwave power was used to produce discharge plasma with methane as working gas,and-20KV voltage pulses were applied to the substrate holder to accelerate ions in the plasma.Confocal Raman spectra confirmed the DLC characteristics of the films.Fourier-transform infrared characterization indicates that the DLC films were composed of sp^3 and sp^2 carbonbonded hydrogen.The hardness of the films was evaluated with a Nano Indenter-XP System.The result shows that the highest hardness valus was 14.6 GPa.The surface rms roughness of the films was as low as 0.104nm measured with an atomic force microscope.The friction coeffcient of the films was checked using a ball-on-disk microtribometer.The average friction coefficient is approximately 0.122.
文摘Progress of the theoretical studies on the ion sheath dynamics in plasma source ion implantation (PSII) is reviewed in this paper. Several models for simulating the ion sheath dynamics in PSII are provided. The main problem of nonuniform ion implantation on the target in PSII is dis-cussed by analyzing some calculated results. In addition, based on the relative researches in our laboratory, some cal-culated results of the ion sheath dynamics in PSII for inner surface modification of a cylindrical bore are presented. Fi-nally, new ideas and tendency for future researches on ion sheath dynamics in PSII are proposed.
