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Hole Mobility in Poly (N-vinylcarbazole) Thin Film Based on Silicium
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作者 CHENBaijun WANGXiaowei 《Semiconductor Photonics and Technology》 CAS 1997年第4期296-300,共5页
The mobilities of holes in thin,spin-casting films of poly( N -vinylcarbazole)(PVK) based on silicium are measured using a time-of-flight (TOF) technique.The drift of hole mobility is strongly dependent on the elect... The mobilities of holes in thin,spin-casting films of poly( N -vinylcarbazole)(PVK) based on silicium are measured using a time-of-flight (TOF) technique.The drift of hole mobility is strongly dependent on the electric field and temperature.At room temperature and an electric field of 2×10 5 V·cm -1 ,the effective mobility of hole is 7.14×10 -6 cm 2·V -1 ·s -1 ,in a 200 nm thick sample. 展开更多
关键词 MOBILITY Organic Semiconductor Time of Flight
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