Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated ...Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C^N type.展开更多
The present paper reports the rapid surface alloying induced by the bombardment of high-current pulsed electron beam. Two kinds of substrate materials were examined to show this effect. The first sample was a pure Al ...The present paper reports the rapid surface alloying induced by the bombardment of high-current pulsed electron beam. Two kinds of substrate materials were examined to show this effect. The first sample was a pure Al metal pre-coated with fine carbon powders prior to the bombardment, and the second alloy is the D2-Crl2MolVl mould steel pre-coated with Cr, Ti, and TiN powders. The surface elements diffuse about several micrometers into the substrate materials only after several bombardments. Tribological behaviors of these samples were characterized and significant improvement in wear resistance was found. Finally, a TEM analysis reveals the presence of stress waves generated by coupled thermal and stress fields, which was considered as the main cause of the enhanced properties.展开更多
基金supported by the National Natural Science Foundation of China under grant number 50135040&90206022.
文摘Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C^N type.
文摘The present paper reports the rapid surface alloying induced by the bombardment of high-current pulsed electron beam. Two kinds of substrate materials were examined to show this effect. The first sample was a pure Al metal pre-coated with fine carbon powders prior to the bombardment, and the second alloy is the D2-Crl2MolVl mould steel pre-coated with Cr, Ti, and TiN powders. The surface elements diffuse about several micrometers into the substrate materials only after several bombardments. Tribological behaviors of these samples were characterized and significant improvement in wear resistance was found. Finally, a TEM analysis reveals the presence of stress waves generated by coupled thermal and stress fields, which was considered as the main cause of the enhanced properties.
